JPS6319860B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a pattern plate for forming a shadow mask.

In general, a shadow mask is made by applying a resist film to both sides of a metal plate, exposing and developing two pattern plates, one on the large hole side and the other on the small hole side, each of which has a large number of hole patterns formed on the resist film. Then, the exposed portion of the resist film is removed to form a resist pattern, and the metal plate is etched from both sides using this resist pattern as a mask. Conventionally, the pattern plate used for manufacturing such a shadow mask has a hole pattern 3 formed on a glass dry plate 2 on which an outer frame pattern 1 corresponding to the outer shape of the shadow mask plate before molding is formed, as shown in FIG. (The area to be occupied by a collection of hole patterns is referred to as an effective area) is formed by pasting a hole pattern film 4 with a pasting tape 5. Note that the pattern plate shown in FIG. 1 is either on the large hole side or the small hole side, and the other pattern plate does not need to have an outer frame pattern formed thereon.

According to the pattern plate formed by such a method, when the large hole side pattern and the small hole side pattern are aligned and brought into close contact with the resist film, the hole pattern film 4 (the film base is made of synthetic resin) is formed. Due to the expansion and contraction of the shadow mask, accurate positioning cannot be performed, and therefore it is difficult to manufacture a shadow mask with high precision. Also,
According to the above method, if the size of the effective part differs for each type of shadow mask, it is necessary to create a different hole pattern film each time, which is inefficient and requires changes in the hole pattern pitch and hole diameter. In the absence of such a film, it has been desired to use the same hole pattern film for a wide variety of products.

The present invention was made under the above circumstances, and an object of the present invention is to manufacture a pattern plate for a shadow mask with high precision and high efficiency.

That is, the method for manufacturing a pattern plate for a shadow mask according to the present invention includes: (a) stacking a hole pattern plate having a positive hole pattern and alignment marks in the peripheral area on a first glass dry plate and performing a first exposure; (b) forming a latent image of a negative hole pattern and a latent image of an alignment mark on a first glass plate; (b) partially developing an alignment mark in a peripheral area of the first glass plate; (c) An outer shape mask plate having a light shielding part corresponding to the effective part of the shadow mask and an alignment mark in the peripheral area is placed on the first glass dry plate,
A step of performing a second exposure by overlapping the two alignment marks so that they match, and erasing the latent image of the unnecessary hole pattern on the first glass dry plate other than the area covered by the light shielding part, ( d) developing a latent image of the hole pattern that has not been erased on the first glass drying plate to create a negative pattern, a master plate; and (e) forming a positive pattern plate from the negative master plate. It is characterized by comprising the following.

The method of the present invention is applicable to the production of both front and back pattern plates for forming shadow masks. When manufacturing a pattern plate having only a hole pattern, step (e) may be performed by simply inverting the negative master plate to form a positive pattern plate. When manufacturing a pattern plate having a hole pattern and an outer frame pattern, the step (e) includes stacking the negative master plate on a second glass dry plate and performing a third exposure to form a positive hole pattern. forming a latent image of and a latent image of an alignment mark on a second glass plate; partially developing the alignment mark in a peripheral area of the second glass plate;
A negative outer shape mask plate having an outer frame pattern and an alignment mark is superimposed on the second glass dry plate so that the alignment marks of both sides match, and a fourth exposure is performed, and a fourth exposure is performed on the glass dry plate. forming a latent image of the outer frame pattern; and developing the hole pattern and the latent image of the outer frame pattern on the second glass dry plate to form a positive pattern plate having the hole pattern and the outer frame pattern. be done.
Note that either the pattern version having only the hole pattern or the hole pattern having the hole pattern and the outer frame pattern may be the version on the large hole side or the version on the small hole side. This is because it is possible to sufficiently penetrate the outer frame portion of the shadow mask by etching from either side.

Embodiments of the present invention will be described below with reference to the drawings.

Example 1 FIG. 2 shows the manufacturing process of a small hole example pattern plate having only a hole pattern.

First, a hole pattern plate 12 is placed on a glass dry plate 11 and exposed to light to form a latent image. Hole pattern version 1
2 has a positive small hole pattern 13 and 4 in the surrounding area.
alignment marks 14 are provided.
This hole pattern plate 12 is made by a special printing machine.
A hole pattern is formed on the entire surface. Then, only the alignment marks 14' in the peripheral area of the glass dry plate 11 are partially developed. Partial development is carried out in a dark room by applying a developer and a fixer only to the area to be developed. Note that the latent image of the hole pattern remains on the glass dry plate 11 even after partial development.

After that, the outer shape mask 15 is placed on the glass dry plate 11.
Exposure is performed by overlapping the images. The outer shape mask 15 has a light shielding part 16 corresponding to the effective part of the shadow mask, that is, a part where a large number of holes are to be formed, and an alignment mark 17 in the peripheral area. The positioning of the glass dry plate 11 and the external mask 15 can be performed with high precision by matching the positioning mark 14' of the dry plate 11 with the positioning mark 17 of the external mask 15. By this exposure, the latent image of the unnecessary hole pattern other than the necessary hole pattern area shielded by the light shielding part 16 is erased.

Next, the latent image of the hole pattern that has not been erased on the glass drying plate 11 is developed, and the hole pattern 1 is placed in the effective area.
A negative master plate 19 having 8 is created. Finally, this negative master plate 19 is inverted onto another glass dry plate to obtain a small hole side pattern plate 20 for a shadow mask having a positive hole pattern 18'.

Example 2 FIG. 3 shows the manufacturing process of a large hole side pattern plate having both a hole pattern and an outer frame pattern.

First, a negative master plate 22 manufactured in the same manufacturing process as in Example 1 except for forming a large hole pattern is stacked on a glass dry plate 21 and exposed to light to form a latent image. The negative master plate 22 has a hole pattern 23 and alignment marks 24. Next, in the same manner as in Example 1, the alignment marks 24' on the periphery of the glass dry plate 21 are partially developed.

Thereafter, a negative-type outer-mask plate 26 obtained by inverting the positive-type outer-mask film 25 is placed on the glass dry plate 21 and exposed. The negative outer shape mask plate 26 has a negative outer frame pattern 27 corresponding to the outer shape of the shadow mask plate before molding, and alignment marks 28. The alignment between the glass drying plate 21 and the negative-type external mask plate 26 is performed using the alignment mark 24' on the glass drying plate 21 and the alignment mark 2 on the negative-type external mask plate 26.
This can be done with high accuracy by matching 8.

Finally, by developing the entire surface of the glass dry plate 21, a large hole side pattern plate 31 for a shadow mask having a hole pattern 29 and a frame pattern 30 is obtained.

According to the method of the present invention described above, it is possible to form a hole pattern and an outer frame pattern on a glass dry plate without pasting a hole pattern film as in the conventional method. Therefore, the pattern plates on the two plates on the large hole side and the small hole side can be brought into close contact with the resist layers coated on the front and back surfaces of the metal plate with high accuracy without deterioration in accuracy due to expansion and contraction of the film. Furthermore, alignment between the glass dry plate and the external mask can be performed with high precision using alignment marks formed by partial development of the glass dry plate. Furthermore, all of the processes of the present invention can be performed continuously in a dark room, so the time required for the process can be shortened, and thereby problems caused by changes over time during the process, such as changes in photosensitivity, can be avoided. It never happens.

[Brief explanation of the drawing]

FIG. 1 is a plan view of a pattern plate for a shadow mask obtained by a conventional method, FIG. 2 is a manufacturing process diagram of a pattern plate for a shadow mask according to an embodiment of the present invention, and FIG. It is a manufacturing process diagram of the pattern plate for shadow masks which is another Example. 1, 27, 30... Outer frame pattern, 2, 11,
21...Glass dry plate, 3, 13, 18, 18',
23, 29... Hole pattern, 4... Hole pattern film, 5... Pasting tape, 12... Hole pattern board, 14, 14', 17, 24, 24', 2
8... Positioning mark, 15, 26... External mask, 16... Light shielding section, 19, 22... Master plate, 20, 31... Pattern plate for shadow mask, 25... External mask film.

Claims (1)

[Claims] 1 (a) A hole pattern plate having a positive hole pattern and alignment marks in the surrounding area is superimposed on a first glass dry plate, and a first exposure is performed to form a latent image of a negative hole pattern. (b) partially developing the alignment mark in a peripheral area of the first glass dry plate; (c) corresponding to the effective portion of the shadow mask; an outer shape mask plate having a light shielding part and an alignment mark in a peripheral area on the first glass dry plate;
A step of performing a second exposure by overlapping the two alignment marks so that they match, and erasing the latent image of the unnecessary hole pattern on the first glass dry plate other than the area covered by the light shielding part, ( d) developing a latent image of the unerased hole pattern on the first glass plate to create a negative master plate; and (e) forming a positive pattern plate from the negative master plate. A method for manufacturing a pattern plate for a shadow mask, comprising: 2. The method of manufacturing a pattern plate for a shadow mask according to claim 1, wherein the step (e) comprises inverting the negative master plate to form a positive pattern plate. 3 The step (e) involves converting the negative master plate into a second
forming a latent image of a positive hole pattern and a latent image of alignment marks on a second glass plate in a peripheral area of said second glass plate; The alignment marks are partially developed, and a negative outer shape mask plate having an outer frame pattern and an alignment mark is superimposed on the second glass dry plate so that the alignment marks of both sides match. Perform the exposure of
forming a latent image of an outer frame pattern on the second glass dry plate, developing a latent image of the hole pattern and the latent image of the outer frame pattern on the second glass dry plate, and forming a positive image having the hole pattern and the outer frame pattern; A method for manufacturing a pattern plate for a shadow mask according to claim 1, which comprises forming a mold pattern plate.