JPS6319860B2 - - Google Patents
Info
- Publication number
- JPS6319860B2 JPS6319860B2 JP59032840A JP3284084A JPS6319860B2 JP S6319860 B2 JPS6319860 B2 JP S6319860B2 JP 59032840 A JP59032840 A JP 59032840A JP 3284084 A JP3284084 A JP 3284084A JP S6319860 B2 JPS6319860 B2 JP S6319860B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- pattern
- latent image
- hole pattern
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59032840A JPS60176040A (ja) | 1984-02-23 | 1984-02-23 | シヤドウマスク用パタ−ン版の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59032840A JPS60176040A (ja) | 1984-02-23 | 1984-02-23 | シヤドウマスク用パタ−ン版の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60176040A JPS60176040A (ja) | 1985-09-10 |
| JPS6319860B2 true JPS6319860B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-04-25 |
Family
ID=12370016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59032840A Granted JPS60176040A (ja) | 1984-02-23 | 1984-02-23 | シヤドウマスク用パタ−ン版の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60176040A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4107762B4 (de) * | 1990-03-09 | 2006-07-13 | Dai Nippon Printing Co., Ltd. | Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5112986B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-10-04 | 1976-04-23 | ||
| JPS5355218A (en) * | 1976-10-27 | 1978-05-19 | Tokyo Shibaura Electric Co | Positioning method of multiilaminated printing |
| JPS5835538A (ja) * | 1981-08-27 | 1983-03-02 | Mitsubishi Electric Corp | パタ−ンマスクの作製方法 |
-
1984
- 1984-02-23 JP JP59032840A patent/JPS60176040A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60176040A (ja) | 1985-09-10 |