JPS6316900B2 - - Google Patents

Info

Publication number
JPS6316900B2
JPS6316900B2 JP20344481A JP20344481A JPS6316900B2 JP S6316900 B2 JPS6316900 B2 JP S6316900B2 JP 20344481 A JP20344481 A JP 20344481A JP 20344481 A JP20344481 A JP 20344481A JP S6316900 B2 JPS6316900 B2 JP S6316900B2
Authority
JP
Japan
Prior art keywords
mark
waveform signal
signal
electron beam
slice level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP20344481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58105542A (ja
Inventor
Hisatake Yokochi
Masahide Okumura
Susumu Ozasa
Korehito Matsuda
Tsuneo Ookubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP20344481A priority Critical patent/JPS58105542A/ja
Publication of JPS58105542A publication Critical patent/JPS58105542A/ja
Publication of JPS6316900B2 publication Critical patent/JPS6316900B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP20344481A 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置 Granted JPS58105542A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20344481A JPS58105542A (ja) 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20344481A JPS58105542A (ja) 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置

Publications (2)

Publication Number Publication Date
JPS58105542A JPS58105542A (ja) 1983-06-23
JPS6316900B2 true JPS6316900B2 (fr) 1988-04-11

Family

ID=16474207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20344481A Granted JPS58105542A (ja) 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置

Country Status (1)

Country Link
JP (1) JPS58105542A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0387190U (fr) * 1989-12-22 1991-09-04

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125623A (ja) * 1982-12-27 1984-07-20 Fujitsu Ltd 電子ビ−ム露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0387190U (fr) * 1989-12-22 1991-09-04

Also Published As

Publication number Publication date
JPS58105542A (ja) 1983-06-23

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