JPS63165404A - 光重合性組成物 - Google Patents

光重合性組成物

Info

Publication number
JPS63165404A
JPS63165404A JP31519486A JP31519486A JPS63165404A JP S63165404 A JPS63165404 A JP S63165404A JP 31519486 A JP31519486 A JP 31519486A JP 31519486 A JP31519486 A JP 31519486A JP S63165404 A JPS63165404 A JP S63165404A
Authority
JP
Japan
Prior art keywords
group
substituted
alkyl
atom
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31519486A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0588842B2 (enrdf_load_stackoverflow
Inventor
Koichi Kawamura
浩一 川村
Mitsuru Koike
充 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP31519486A priority Critical patent/JPS63165404A/ja
Priority to DE19873743875 priority patent/DE3743875C2/de
Publication of JPS63165404A publication Critical patent/JPS63165404A/ja
Priority to US07/484,277 priority patent/US5238782A/en
Publication of JPH0588842B2 publication Critical patent/JPH0588842B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP31519486A 1986-12-26 1986-12-26 光重合性組成物 Granted JPS63165404A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP31519486A JPS63165404A (ja) 1986-12-26 1986-12-26 光重合性組成物
DE19873743875 DE3743875C2 (de) 1986-12-26 1987-12-23 Lichtempfindliches Gemisch
US07/484,277 US5238782A (en) 1986-12-26 1990-02-26 Photopolymerizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31519486A JPS63165404A (ja) 1986-12-26 1986-12-26 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS63165404A true JPS63165404A (ja) 1988-07-08
JPH0588842B2 JPH0588842B2 (enrdf_load_stackoverflow) 1993-12-24

Family

ID=18062544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31519486A Granted JPS63165404A (ja) 1986-12-26 1986-12-26 光重合性組成物

Country Status (2)

Country Link
JP (1) JPS63165404A (enrdf_load_stackoverflow)
DE (1) DE3743875C2 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5260161A (en) * 1989-05-06 1993-11-09 Konica Corporation Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin
DE69007847T2 (de) * 1989-05-06 1994-08-11 Konishiroku Photo Ind Lichtempfindliche Zusammensetzung und lichtempfindliche lithographische Druckplatte.
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2850585A1 (de) * 1978-11-22 1980-06-04 Hoechst Ag Photopolymerisierbares gemisch
US4698286A (en) * 1985-06-03 1987-10-06 Hercules Incorporated Plasma developable photoresist compositions containing perylene coumarin photosensitizer

Also Published As

Publication number Publication date
JPH0588842B2 (enrdf_load_stackoverflow) 1993-12-24
DE3743875A1 (de) 1988-07-21
DE3743875C2 (de) 1995-11-09

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