JPS63164219U - - Google Patents

Info

Publication number
JPS63164219U
JPS63164219U JP17786886U JP17786886U JPS63164219U JP S63164219 U JPS63164219 U JP S63164219U JP 17786886 U JP17786886 U JP 17786886U JP 17786886 U JP17786886 U JP 17786886U JP S63164219 U JPS63164219 U JP S63164219U
Authority
JP
Japan
Prior art keywords
power source
high frequency
frequency power
upper electrodes
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17786886U
Other languages
English (en)
Other versions
JPH0513006Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986177868U priority Critical patent/JPH0513006Y2/ja
Publication of JPS63164219U publication Critical patent/JPS63164219U/ja
Application granted granted Critical
Publication of JPH0513006Y2 publication Critical patent/JPH0513006Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図は本考案に係るプラズマ処理装置の全体
図、第２図及び第３図は本考案に係る装置によつ
てエツチングを施したウエハーの拡大断面図、第
４図は従来のプラズマ処理装置を示す図、第５図
は従来装置によつてエツチングを施したウエハー
拡大断面図である。 尚、図面中２はチヤンバー、３，４は半筒状上
部電極、５は高周波電源、９は下部電極、Ｗは半
導体ウエハーである。

Claims (1)

    【実用新案登録請求の範囲】
  1. ベルジヤー型チヤンバーの上部に半筒状に分割
    された一対の上部電極を設け、これら上部電極の
    一方を高周波電源に接続し、他方をアースし、さ
    らにチヤンバー内下部に臨むテーブル状下部電極
    を高周波電源に接続したことを特徴とするプラズ
    マ反応処理装置。
JP1986177868U 1986-11-19 1986-11-19 Expired - Lifetime JPH0513006Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986177868U JPH0513006Y2 (ja) 1986-11-19 1986-11-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986177868U JPH0513006Y2 (ja) 1986-11-19 1986-11-19

Publications (2)

Publication Number Publication Date
JPS63164219U true JPS63164219U (ja) 1988-10-26
JPH0513006Y2 JPH0513006Y2 (ja) 1993-04-06

Family

ID=31119471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986177868U Expired - Lifetime JPH0513006Y2 (ja) 1986-11-19 1986-11-19

Country Status (1)

Country Link
JP (1) JPH0513006Y2 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5681678A (en) * 1979-12-05 1981-07-03 Toshiba Corp Method and apparatus for plasma etching
JPS6045024A (ja) * 1983-08-23 1985-03-11 Toshiba Corp ドライエツチング装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5681678A (en) * 1979-12-05 1981-07-03 Toshiba Corp Method and apparatus for plasma etching
JPS6045024A (ja) * 1983-08-23 1985-03-11 Toshiba Corp ドライエツチング装置

Also Published As

Publication number Publication date
JPH0513006Y2 (ja) 1993-04-06

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