JPS61203544U - - Google Patents

Info

Publication number
JPS61203544U
JPS61203544U JP8842485U JP8842485U JPS61203544U JP S61203544 U JPS61203544 U JP S61203544U JP 8842485 U JP8842485 U JP 8842485U JP 8842485 U JP8842485 U JP 8842485U JP S61203544 U JPS61203544 U JP S61203544U
Authority
JP
Japan
Prior art keywords
chamber
reaction processing
faces
mounting table
sample mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8842485U
Other languages
English (en)
Other versions
JPH0517880Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985088424U priority Critical patent/JPH0517880Y2/ja
Publication of JPS61203544U publication Critical patent/JPS61203544U/ja
Application granted granted Critical
Publication of JPH0517880Y2 publication Critical patent/JPH0517880Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
第1図は本考案に係る一実施例であるプラズマ
反応処理装置の正面図、第2図は同プラズマ反応
処理装置の断面図、第3図は別実施例に係るプラ
ズマ反応処理装置の断面図である。 尚、図面中1はプラズマ反応処理装置、2,2
0は本体、5は外部電極、7はチヤンバー、8は
内部電極、9は小孔、15は試料載置台、S
プラズマ発生室、Sは反応処理室、Wは試料で
ある。

Claims (1)

    【実用新案登録請求の範囲】
  1. チヤンバーの外側に外部電極を設け、この外部
    電極と対峠する多数の小孔を形成した内部電極を
    チヤンバー内に配設することでチヤンバー内を上
    部のプラズマ発生室と下部の反応処理室とに区画
    し、この反応処理室には試料を一枚づつ処理する
    ための試料載置台を臨ませ、更に前記外部電極、
    内部電極及び試料載置台上面をそれぞれ平行関係
    をもつて配設したことを特徴とするプラズマ反応
    処理装置。
JP1985088424U 1985-06-12 1985-06-12 Expired - Lifetime JPH0517880Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985088424U JPH0517880Y2 (ja) 1985-06-12 1985-06-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985088424U JPH0517880Y2 (ja) 1985-06-12 1985-06-12

Publications (2)

Publication Number Publication Date
JPS61203544U true JPS61203544U (ja) 1986-12-22
JPH0517880Y2 JPH0517880Y2 (ja) 1993-05-13

Family

ID=30641543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985088424U Expired - Lifetime JPH0517880Y2 (ja) 1985-06-12 1985-06-12

Country Status (1)

Country Link
JP (1) JPH0517880Y2 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324303A (en) * 1976-08-19 1978-03-07 Still Carl Friedrich Device for autmatically and periodically switching regenerative heating of coke oven battery and changing kind of heating gas
JPS5494282A (en) * 1977-12-30 1979-07-25 Ibm Negative ion extractor
JPS5799743A (en) * 1980-12-11 1982-06-21 Matsushita Electric Ind Co Ltd Apparatus and method of plasma etching

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324303A (en) * 1976-08-19 1978-03-07 Still Carl Friedrich Device for autmatically and periodically switching regenerative heating of coke oven battery and changing kind of heating gas
JPS5494282A (en) * 1977-12-30 1979-07-25 Ibm Negative ion extractor
JPS5799743A (en) * 1980-12-11 1982-06-21 Matsushita Electric Ind Co Ltd Apparatus and method of plasma etching

Also Published As

Publication number Publication date
JPH0517880Y2 (ja) 1993-05-13

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