JPH0233234U - - Google Patents

Info

Publication number
JPH0233234U
JPH0233234U JP10935188U JP10935188U JPH0233234U JP H0233234 U JPH0233234 U JP H0233234U JP 10935188 U JP10935188 U JP 10935188U JP 10935188 U JP10935188 U JP 10935188U JP H0233234 U JPH0233234 U JP H0233234U
Authority
JP
Japan
Prior art keywords
grounded electrode
controlled
grounded
whose temperature
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10935188U
Other languages
English (en)
Other versions
JPH0630877Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988109351U priority Critical patent/JPH0630877Y2/ja
Publication of JPH0233234U publication Critical patent/JPH0233234U/ja
Application granted granted Critical
Publication of JPH0630877Y2 publication Critical patent/JPH0630877Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Description

【図面の簡単な説明】
第１図は本考案装置の一具体例を示す箱形のプ
ラズマ処理装置の正面概要図であり、第２図は電
極群の正面概要図である。第３図は、実施例に用
いた装置の電極回りの模式図である。

Claims (1)

    【実用新案登録請求の範囲】
  1. 温調可能な複数の非接地電極１と、該非接地電
    極群の外側に温調可能な接地電極２とを配置し、
    かつ被処理物８を該非接地電極に接触させる為の
    案内手段６とを真空容器３中に具備する事を特徴
    とするプラズマ処理装置。
JP1988109351U 1988-08-19 1988-08-19 プラズマ処理装置 Expired - Lifetime JPH0630877Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988109351U JPH0630877Y2 (ja) 1988-08-19 1988-08-19 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988109351U JPH0630877Y2 (ja) 1988-08-19 1988-08-19 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH0233234U true JPH0233234U (ja) 1990-03-01
JPH0630877Y2 JPH0630877Y2 (ja) 1994-08-17

Family

ID=31345516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988109351U Expired - Lifetime JPH0630877Y2 (ja) 1988-08-19 1988-08-19 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPH0630877Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016502588A (ja) * 2012-10-09 2016-01-28 ユーロブラズマ エンヴェー 表面コーティングを塗布する装置及び方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60226533A (ja) * 1984-04-25 1985-11-11 Hitachi Ltd 連続式プラズマ処理装置
JPS63120163A (ja) * 1986-11-07 1988-05-24 堤　四郎 低温プラズマ発生装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60226533A (ja) * 1984-04-25 1985-11-11 Hitachi Ltd 連続式プラズマ処理装置
JPS63120163A (ja) * 1986-11-07 1988-05-24 堤　四郎 低温プラズマ発生装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016502588A (ja) * 2012-10-09 2016-01-28 ユーロブラズマ エンヴェー 表面コーティングを塗布する装置及び方法
JP2019035153A (ja) * 2012-10-09 2019-03-07 ユーロブラズマ エンヴェー 表面コーティングを塗布する装置及び方法

Also Published As

Publication number Publication date
JPH0630877Y2 (ja) 1994-08-17

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