JPS63162862U - - Google Patents
Info
- Publication number
- JPS63162862U JPS63162862U JP3500388U JP3500388U JPS63162862U JP S63162862 U JPS63162862 U JP S63162862U JP 3500388 U JP3500388 U JP 3500388U JP 3500388 U JP3500388 U JP 3500388U JP S63162862 U JPS63162862 U JP S63162862U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- carrier
- vacuum
- chemical reaction
- carriers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims 4
- 239000000969 carrier Substances 0.000 claims 3
- 230000005684 electric field Effects 0.000 claims 2
- 230000007723 transport mechanism Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3500388U JPS63162862U (enrdf_load_stackoverflow) | 1988-03-16 | 1988-03-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3500388U JPS63162862U (enrdf_load_stackoverflow) | 1988-03-16 | 1988-03-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63162862U true JPS63162862U (enrdf_load_stackoverflow) | 1988-10-24 |
Family
ID=30844091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3500388U Pending JPS63162862U (enrdf_load_stackoverflow) | 1988-03-16 | 1988-03-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63162862U (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5016476A (enrdf_load_stackoverflow) * | 1973-04-27 | 1975-02-21 |
-
1988
- 1988-03-16 JP JP3500388U patent/JPS63162862U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5016476A (enrdf_load_stackoverflow) * | 1973-04-27 | 1975-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR970013175A (ko) | 기판처리장치 | |
| TWI678755B (zh) | 於一真空系統處理一遮罩裝置之方法、用以於一真空系統中處理一遮罩裝置之遮罩處理組件、用以沈積一材料於一基板上之真空系統及於一真空系統中處理數個遮罩裝置之方法 | |
| EP0377464B1 (en) | Wafer processing system | |
| US4851101A (en) | Sputter module for modular wafer processing machine | |
| JP4130675B2 (ja) | 工作物の移送装置及び処理方法 | |
| JP4567442B2 (ja) | 複数場所コーティング装置およびプラズマコーティングの方法 | |
| US4548699A (en) | Transfer plate rotation system | |
| US8377210B2 (en) | Film forming apparatus | |
| EP0246453A2 (en) | Novel multiple-processing and contamination-free plasma etching system | |
| JPH04308090A (ja) | 気相化学反応生成装置のロードロック機構 | |
| EP0734056A3 (en) | Ceramic blades for semiconductor processing apparatus | |
| JP3734843B2 (ja) | 真空処理装置及びディスク状加工物の製造方法 | |
| JPS6169966A (ja) | 真空処理装置 | |
| JPS63162862U (enrdf_load_stackoverflow) | ||
| CA2051214A1 (en) | Vacuum Film Forming Apparatus | |
| JPS63128710A (ja) | 反応炉 | |
| JPH06264240A (ja) | 真空設備のためのチャンバおよび複合チャンバ、ならびに1つ以上の工作物を送り込む方法 | |
| JPH02271643A (ja) | ウエハ搬送装置 | |
| JPS6223983A (ja) | 真空化学反応装置 | |
| JPH05263228A (ja) | スパッタリング装置 | |
| JP2868767B2 (ja) | 半導体ウエハ処理装置 | |
| JPS63243276A (ja) | 真空化学反応装置 | |
| JP2022504743A (ja) | 真空処理装置、及び基板を真空処理するための方法 | |
| JPS6145804A (ja) | 半導体ウエハ搬送装置 | |
| JPS62204515A (ja) | 試料の搬送装置 |