JPS63145776A - 被膜作成方法 - Google Patents

被膜作成方法

Info

Publication number
JPS63145776A
JPS63145776A JP22938587A JP22938587A JPS63145776A JP S63145776 A JPS63145776 A JP S63145776A JP 22938587 A JP22938587 A JP 22938587A JP 22938587 A JP22938587 A JP 22938587A JP S63145776 A JPS63145776 A JP S63145776A
Authority
JP
Japan
Prior art keywords
carbon
film
substrate
gas
amorphous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22938587A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0372711B2 (enrdf_load_stackoverflow
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP22938587A priority Critical patent/JPS63145776A/ja
Publication of JPS63145776A publication Critical patent/JPS63145776A/ja
Publication of JPH0372711B2 publication Critical patent/JPH0372711B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP22938587A 1987-09-12 1987-09-12 被膜作成方法 Granted JPS63145776A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22938587A JPS63145776A (ja) 1987-09-12 1987-09-12 被膜作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22938587A JPS63145776A (ja) 1987-09-12 1987-09-12 被膜作成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56140653A Division JPS5842472A (ja) 1981-09-07 1981-09-07 サ−マルヘツド

Publications (2)

Publication Number Publication Date
JPS63145776A true JPS63145776A (ja) 1988-06-17
JPH0372711B2 JPH0372711B2 (enrdf_load_stackoverflow) 1991-11-19

Family

ID=16891358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22938587A Granted JPS63145776A (ja) 1987-09-12 1987-09-12 被膜作成方法

Country Status (1)

Country Link
JP (1) JPS63145776A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0649645A (ja) * 1992-07-31 1994-02-22 Yoshida Kogyo Kk <Ykk> 硬質多層膜形成体およびその製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6475836B1 (en) 1999-03-29 2002-11-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4943078A (enrdf_load_stackoverflow) * 1972-08-30 1974-04-23
JPS5328576A (en) * 1976-08-13 1978-03-16 Nat Res Dev Surface coating process with cargonaceous material and apparatus therefor
JPS566920A (en) * 1979-06-28 1981-01-24 Philips Nv Dry lubricating bearing
JPS57111220A (en) * 1980-08-21 1982-07-10 Nat Res Dev Carbon layer coating method
JPS6153955A (ja) * 1984-08-24 1986-03-18 松下電工株式会社 エア−コレクタの取付構造

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4943078A (enrdf_load_stackoverflow) * 1972-08-30 1974-04-23
JPS5328576A (en) * 1976-08-13 1978-03-16 Nat Res Dev Surface coating process with cargonaceous material and apparatus therefor
JPS566920A (en) * 1979-06-28 1981-01-24 Philips Nv Dry lubricating bearing
JPS57111220A (en) * 1980-08-21 1982-07-10 Nat Res Dev Carbon layer coating method
JPS6153955A (ja) * 1984-08-24 1986-03-18 松下電工株式会社 エア−コレクタの取付構造

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0649645A (ja) * 1992-07-31 1994-02-22 Yoshida Kogyo Kk <Ykk> 硬質多層膜形成体およびその製造方法

Also Published As

Publication number Publication date
JPH0372711B2 (enrdf_load_stackoverflow) 1991-11-19

Similar Documents

Publication Publication Date Title
JPS6153955B2 (enrdf_load_stackoverflow)
US6207281B1 (en) Electrostatic-erasing abrasion-proof coating and method for forming the same
JPS6232157B2 (enrdf_load_stackoverflow)
JPH05506064A (ja) 電子用途用ダイヤモンド載置基板
JPH09186153A (ja) 無定形SiNC被膜を蒸着する方法
JPS6241476B2 (enrdf_load_stackoverflow)
JP2592392B2 (ja) 珪素を含む炭素被膜の作製方法
JP3509856B2 (ja) 安定化層のための保護層及びその製法
JPS63145776A (ja) 被膜作成方法
US6224952B1 (en) Electrostatic-erasing abrasion-proof coating and method for forming the same
JPS6379972A (ja) 炭素被膜
US4393967A (en) Electrostatic clutch
JPH0462866B2 (enrdf_load_stackoverflow)
JP2673766B2 (ja) 炭素を主成分とする材料の作製方法
JPH0512152B2 (enrdf_load_stackoverflow)
Droes et al. Plasma-enhanced chemical vapor deposition (PECVD)
JP3197545B2 (ja) 炭素被膜
JPH03205161A (ja) サーマルヘッド
JP3072893B2 (ja) 炭素被膜
JP3197889B2 (ja) 炭素膜の作製方法
JPH0579236B2 (enrdf_load_stackoverflow)
JP3005604B2 (ja) 炭素被膜の作製方法
JPS62180073A (ja) 非晶質炭素膜およびその製造方法
JP2879088B2 (ja) サ−マルヘッド
JP2566137B2 (ja) 薄膜の製造方法