JPS63141313A - 薄板変形装置 - Google Patents

薄板変形装置

Info

Publication number
JPS63141313A
JPS63141313A JP61286814A JP28681486A JPS63141313A JP S63141313 A JPS63141313 A JP S63141313A JP 61286814 A JP61286814 A JP 61286814A JP 28681486 A JP28681486 A JP 28681486A JP S63141313 A JPS63141313 A JP S63141313A
Authority
JP
Japan
Prior art keywords
thin plate
wafer
electrostrictive element
plate sample
linear electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61286814A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0556013B2 (enrdf_load_stackoverflow
Inventor
Akira Inagaki
晃 稲垣
Ryuichi Funatsu
隆一 船津
Yukio Kenbo
行雄 見坊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61286814A priority Critical patent/JPS63141313A/ja
Publication of JPS63141313A publication Critical patent/JPS63141313A/ja
Publication of JPH0556013B2 publication Critical patent/JPH0556013B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP61286814A 1986-12-03 1986-12-03 薄板変形装置 Granted JPS63141313A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61286814A JPS63141313A (ja) 1986-12-03 1986-12-03 薄板変形装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61286814A JPS63141313A (ja) 1986-12-03 1986-12-03 薄板変形装置

Publications (2)

Publication Number Publication Date
JPS63141313A true JPS63141313A (ja) 1988-06-13
JPH0556013B2 JPH0556013B2 (enrdf_load_stackoverflow) 1993-08-18

Family

ID=17709388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61286814A Granted JPS63141313A (ja) 1986-12-03 1986-12-03 薄板変形装置

Country Status (1)

Country Link
JP (1) JPS63141313A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006025341A1 (ja) * 2004-09-01 2006-03-09 Nikon Corporation 基板ホルダ及びステージ装置並びに露光装置
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
WO2006025341A1 (ja) * 2004-09-01 2006-03-09 Nikon Corporation 基板ホルダ及びステージ装置並びに露光装置
US8717543B2 (en) 2004-09-01 2014-05-06 Nikon Corporation Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part
JP4779973B2 (ja) * 2004-09-01 2011-09-28 株式会社ニコン 基板ホルダ及びステージ装置並びに露光装置
JPWO2006025341A1 (ja) * 2004-09-01 2008-05-08 株式会社ニコン 基板ホルダ及びステージ装置並びに露光装置
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JPH0556013B2 (enrdf_load_stackoverflow) 1993-08-18

Similar Documents

Publication Publication Date Title
US11164842B2 (en) Bonding apparatus and bonding system
JPH034341B2 (enrdf_load_stackoverflow)
JPH0360013A (ja) Ｘ線リソグラフイ用薄膜構造体
KR20200100847A (ko) 기판 처리 장치 및 기판 처리 방법
JPS63141313A (ja) 薄板変形装置
JP2750554B2 (ja) 真空吸着装置
JPH0642508B2 (ja) 薄板変形装置およびプロキシミティ露光装置
JPH0831515B2 (ja) 基板の吸着装置
TWI782171B (zh) 基板處理裝置
JPH02271680A (ja) 半導体構造に於けるメサ製造方法
KR20010100758A (ko) 복수의 대전입자 빔 조정과 차폐된 대전입자 빔리소그래피를 위한 미세가공된 템플릿
JPH04324658A (ja) 真空吸着式ウエハ保持装置
JP2808969B2 (ja) 半導体式加速度センサの製造方法
JPH0145217B2 (enrdf_load_stackoverflow)
CN221485791U (zh) 面形调节装置
JP2005091051A (ja) 薄板の水平保持装置
JPS6258541B2 (enrdf_load_stackoverflow)
JPH06103237B2 (ja) ダイヤフラム型圧力センサー
US20250012606A1 (en) Distance measuring device, distance measuring method, bonding apparatus, and bonding method
JPH0588188A (ja) 薄板の組立方法
JPH0368175A (ja) 半導体圧力センサ
JPH01231345A (ja) ウエハチヤツク
CN117270336A (zh) 面形调节装置
KR20240015822A (ko) 증착 장치 및 이의 구동 방법
JPS63122233A (ja) 半導体集積回路の測定装置