JPS63132452U - - Google Patents

Info

Publication number
JPS63132452U
JPS63132452U JP2444187U JP2444187U JPS63132452U JP S63132452 U JPS63132452 U JP S63132452U JP 2444187 U JP2444187 U JP 2444187U JP 2444187 U JP2444187 U JP 2444187U JP S63132452 U JPS63132452 U JP S63132452U
Authority
JP
Japan
Prior art keywords
mos transistor
diffusion layer
well layer
conductivity type
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2444187U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2444187U priority Critical patent/JPS63132452U/ja
Publication of JPS63132452U publication Critical patent/JPS63132452U/ja
Pending legal-status Critical Current

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  • Semiconductor Memories (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係るMOS型ICの模式的断
面構造図、第2図は従来のMOS型ICの模式的
断面構造図である。 10…半導体基板(N型)、11…Pウエル層
、13…MOSトランジスタ、14…N拡散層
、15…フローテイングノード、Isub…基板
電流。
FIG. 1 is a schematic cross-sectional structural diagram of a MOS type IC according to the present invention, and FIG. 2 is a schematic cross-sectional structural diagram of a conventional MOS type IC. DESCRIPTION OF SYMBOLS 10...Semiconductor substrate (N type), 11...P well layer, 13...MOS transistor, 14...N + diffusion layer, 15...floating node, Isub...substrate current.

Claims (1)

【実用新案登録請求の範囲】 一導電型の半導体基板に形成した逆導電型のウ
エル層に、MOSトランジスタと、ウエル層の電
位設定用拡散層と、これらの間に設けられてデー
タを保持するためのフローテイングノードとを備
えてなるMOS型ICにおいて、 前記ウエル層におけるMOSトランジスタと前
記フローテイングノードとの間に、基板電流によ
り生じる電位変動に追従する電位を得る前記逆導
電型の拡散層を設けて、該拡散層とMOSトラン
ジスタのソースとを導電体で接続したことを特徴
とするMOS型IC。
[Claim for Utility Model Registration] A well layer of an opposite conductivity type formed on a semiconductor substrate of one conductivity type, a MOS transistor, a diffusion layer for setting the potential of the well layer, and a diffusion layer provided between these to hold data. A MOS type IC comprising: a floating node for a MOS transistor in the well layer, and a diffusion layer of the opposite conductivity type that obtains a potential that follows potential fluctuations caused by a substrate current between the MOS transistor in the well layer and the floating node. A MOS type IC characterized in that the diffusion layer and the source of the MOS transistor are connected by a conductor.
JP2444187U 1987-02-20 1987-02-20 Pending JPS63132452U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2444187U JPS63132452U (en) 1987-02-20 1987-02-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2444187U JPS63132452U (en) 1987-02-20 1987-02-20

Publications (1)

Publication Number Publication Date
JPS63132452U true JPS63132452U (en) 1988-08-30

Family

ID=30823672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2444187U Pending JPS63132452U (en) 1987-02-20 1987-02-20

Country Status (1)

Country Link
JP (1) JPS63132452U (en)

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