JPS63123668U - - Google Patents

Info

Publication number
JPS63123668U
JPS63123668U JP1610587U JP1610587U JPS63123668U JP S63123668 U JPS63123668 U JP S63123668U JP 1610587 U JP1610587 U JP 1610587U JP 1610587 U JP1610587 U JP 1610587U JP S63123668 U JPS63123668 U JP S63123668U
Authority
JP
Japan
Prior art keywords
magnet
target
substrate holder
thin film
production apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1610587U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1610587U priority Critical patent/JPS63123668U/ja
Publication of JPS63123668U publication Critical patent/JPS63123668U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP1610587U 1987-02-04 1987-02-04 Pending JPS63123668U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1610587U JPS63123668U (enrdf_load_stackoverflow) 1987-02-04 1987-02-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1610587U JPS63123668U (enrdf_load_stackoverflow) 1987-02-04 1987-02-04

Publications (1)

Publication Number Publication Date
JPS63123668U true JPS63123668U (enrdf_load_stackoverflow) 1988-08-11

Family

ID=30807660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1610587U Pending JPS63123668U (enrdf_load_stackoverflow) 1987-02-04 1987-02-04

Country Status (1)

Country Link
JP (1) JPS63123668U (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100981A (en) * 1979-01-24 1980-08-01 Murata Mfg Co Ltd Magnetron sputtering apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100981A (en) * 1979-01-24 1980-08-01 Murata Mfg Co Ltd Magnetron sputtering apparatus

Similar Documents

Publication Publication Date Title
KR880009454A (ko) 스퍼터 성막방법 및 그 장치
GB594809A (en) A method and apparatus for making pattern mirrors and other coatings
JPS63123668U (enrdf_load_stackoverflow)
ES393087A1 (es) Perfeccionamientos en un aparato para la pulverizacion ca- todica.
JPS6254907A (ja) スパツタ装置
JP2008013829A (ja) 金属酸化膜の成膜方法
JP3628395B2 (ja) スパッタカソード
JPS5813622B2 (ja) マグネトロン型スパッタ装置
JPS61272373A (ja) スパツタ装置
JPS6319565U (enrdf_load_stackoverflow)
JP2531052Y2 (ja) マグネトロンスパッタ装置
JPS6221065U (enrdf_load_stackoverflow)
JPS6275063U (enrdf_load_stackoverflow)
JP3996977B2 (ja) 成膜装置およびそのターゲットの交換方法
JPS6334164U (enrdf_load_stackoverflow)
JPS62193660U (enrdf_load_stackoverflow)
JP2001234337A5 (enrdf_load_stackoverflow)
JPH0242060U (enrdf_load_stackoverflow)
JPH0280564A (ja) スパッタリング装置
JPH02132656U (enrdf_load_stackoverflow)
JPS6344728A (ja) スパツタエツチング装置
JPH0261062A (ja) マグネトロンスパッタ装置
JPH02111876A (ja) 複合体のスパッタ装置
JPS63143568U (enrdf_load_stackoverflow)
JPS6465261A (en) Vapor deposition method by plasma ionization