JPS6275063U - - Google Patents

Info

Publication number
JPS6275063U
JPS6275063U JP16564485U JP16564485U JPS6275063U JP S6275063 U JPS6275063 U JP S6275063U JP 16564485 U JP16564485 U JP 16564485U JP 16564485 U JP16564485 U JP 16564485U JP S6275063 U JPS6275063 U JP S6275063U
Authority
JP
Japan
Prior art keywords
generating means
field generating
magnetic field
target
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16564485U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16564485U priority Critical patent/JPS6275063U/ja
Publication of JPS6275063U publication Critical patent/JPS6275063U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP16564485U 1985-10-30 1985-10-30 Pending JPS6275063U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16564485U JPS6275063U (enrdf_load_stackoverflow) 1985-10-30 1985-10-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16564485U JPS6275063U (enrdf_load_stackoverflow) 1985-10-30 1985-10-30

Publications (1)

Publication Number Publication Date
JPS6275063U true JPS6275063U (enrdf_load_stackoverflow) 1987-05-14

Family

ID=31095864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16564485U Pending JPS6275063U (enrdf_load_stackoverflow) 1985-10-30 1985-10-30

Country Status (1)

Country Link
JP (1) JPS6275063U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000026430A1 (fr) * 1998-10-30 2000-05-11 Applied Materials Inc. Appareil de pulverisation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000026430A1 (fr) * 1998-10-30 2000-05-11 Applied Materials Inc. Appareil de pulverisation
US6506290B1 (en) 1998-10-30 2003-01-14 Applied Materials, Inc. Sputtering apparatus with magnetron device

Similar Documents

Publication Publication Date Title
JPS6372876A (ja) マグネトロン原理によるスパツタリング陰極
JPH0133548B2 (enrdf_load_stackoverflow)
JPH0359138B2 (enrdf_load_stackoverflow)
JPS5683826A (en) Vertical magnetic recording and reproducing head
JPH03177569A (ja) スパッタ装置
JPS6275063U (enrdf_load_stackoverflow)
JP2549291B2 (ja) マグネトロンスパッタリング装置
JP2505724B2 (ja) マグネトロンスパッタリング装置
JPS62250174A (ja) 放電電極
JPS5531142A (en) Pressed magnetic field type magnetron sputter by focusing magnetic field
JPS61291971A (ja) 平面放電陰極
JPS62119907A (ja) 磁性薄膜作製用スパツタリング装置
JP2602807B2 (ja) スパツタ用ターゲツトアセンブリ
JP2531052Y2 (ja) マグネトロンスパッタ装置
JPS6264768U (enrdf_load_stackoverflow)
JPS61284571A (ja) 放電電極
JPS61168164U (enrdf_load_stackoverflow)
JPS60193964U (ja) マグネトロンスパツタ装置のタ−ゲツト
JPH02277771A (ja) マグネトロン型スパッタ装置
JPS6026099Y2 (ja) プラズマ重合装置の内部電極構造
JPS58157973A (ja) スパツタ電極
JPS61177367A (ja) スパツタリング装置及びスパツタリング方法
JPS6198864U (enrdf_load_stackoverflow)
JPH02177329A (ja) マグネトロン型スパッタリング装置
JPS6026098Y2 (ja) プラズマ重合装置の内部電極構造