JPS63122123A - マイクロ波プラズマ処理装置 - Google Patents

マイクロ波プラズマ処理装置

Info

Publication number
JPS63122123A
JPS63122123A JP26760186A JP26760186A JPS63122123A JP S63122123 A JPS63122123 A JP S63122123A JP 26760186 A JP26760186 A JP 26760186A JP 26760186 A JP26760186 A JP 26760186A JP S63122123 A JPS63122123 A JP S63122123A
Authority
JP
Japan
Prior art keywords
discharge tube
microwave
wafer
plasma generation
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26760186A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0551173B2 (enrdf_load_html_response
Inventor
Hironori Kawahara
川原　博宣
Yoshinao Kawasaki
義直 川崎
Makoto Nawata
誠 縄田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP26760186A priority Critical patent/JPS63122123A/ja
Publication of JPS63122123A publication Critical patent/JPS63122123A/ja
Publication of JPH0551173B2 publication Critical patent/JPH0551173B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP26760186A 1986-11-12 1986-11-12 マイクロ波プラズマ処理装置 Granted JPS63122123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26760186A JPS63122123A (ja) 1986-11-12 1986-11-12 マイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26760186A JPS63122123A (ja) 1986-11-12 1986-11-12 マイクロ波プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS63122123A true JPS63122123A (ja) 1988-05-26
JPH0551173B2 JPH0551173B2 (enrdf_load_html_response) 1993-07-30

Family

ID=17446996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26760186A Granted JPS63122123A (ja) 1986-11-12 1986-11-12 マイクロ波プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS63122123A (enrdf_load_html_response)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414921A (en) * 1987-07-08 1989-01-19 Anelva Corp Microwave plasma processor
JPH0567586A (ja) * 1991-09-09 1993-03-19 Nec Corp Ｅｃｒプラズマエツチング装置
JPH06267910A (ja) * 1993-03-17 1994-09-22 Hitachi Ltd マイクロ波プラズマ処理装置
US5647944A (en) * 1993-03-17 1997-07-15 Hitachi, Ltd. Microwave plasma treatment apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103340A (ja) * 1983-09-21 1984-06-14 Hitachi Ltd プラズマ処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103340A (ja) * 1983-09-21 1984-06-14 Hitachi Ltd プラズマ処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414921A (en) * 1987-07-08 1989-01-19 Anelva Corp Microwave plasma processor
JPH0567586A (ja) * 1991-09-09 1993-03-19 Nec Corp Ｅｃｒプラズマエツチング装置
JPH06267910A (ja) * 1993-03-17 1994-09-22 Hitachi Ltd マイクロ波プラズマ処理装置
US5647944A (en) * 1993-03-17 1997-07-15 Hitachi, Ltd. Microwave plasma treatment apparatus

Also Published As

Publication number Publication date
JPH0551173B2 (enrdf_load_html_response) 1993-07-30

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Legal Events

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