JPS6414921A - Microwave plasma processor - Google Patents
Microwave plasma processorInfo
- Publication number
- JPS6414921A JPS6414921A JP17066887A JP17066887A JPS6414921A JP S6414921 A JPS6414921 A JP S6414921A JP 17066887 A JP17066887 A JP 17066887A JP 17066887 A JP17066887 A JP 17066887A JP S6414921 A JPS6414921 A JP S6414921A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- microwave
- chamber
- generating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To suppress a reflection wave and to stably introduce a microwave by generating a plasma from gas to be treated by an electron cyclotron resonance phenomenon, and so constructing a microwave plasma processor for irradiating a substrate as to regulate the position of plasma introducing means of the processor. CONSTITUTION:After a substrate processing chamber 8 is reduced under pressure and evacuated, predetermined gas is introduced to maintain it under processing pressure. A microwave is introduced from a microwave generator 3 to a plasma generating chamber 6, a current is supplied from a plasma generating power supply 12 to an air core solenoid coil 7 to generate a magnetic field, thereby generating an electron cyclotron resonance in the chamber 6, and a plasma is generated in high density in the gas. The plasma is introduced from a plasma introduction plate 11 toward the chamber 8, and a thin film is formed on a substrate 10. It is monitored by a power detector 18 through a microwave reflection wave sensor 17 while the plate 11 is being moved, and the plate 11 is stopped when it becomes minimum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62170668A JPH0612764B2 (en) | 1987-07-08 | 1987-07-08 | Microwave plasma processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62170668A JPH0612764B2 (en) | 1987-07-08 | 1987-07-08 | Microwave plasma processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6414921A true JPS6414921A (en) | 1989-01-19 |
JPH0612764B2 JPH0612764B2 (en) | 1994-02-16 |
Family
ID=15909160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62170668A Expired - Lifetime JPH0612764B2 (en) | 1987-07-08 | 1987-07-08 | Microwave plasma processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0612764B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003052807A1 (en) * | 2001-12-14 | 2003-06-26 | Tokyo Electron Limited | Plasma processor |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59103340A (en) * | 1983-09-21 | 1984-06-14 | Hitachi Ltd | Plasma processing apparatus |
JPS63122123A (en) * | 1986-11-12 | 1988-05-26 | Hitachi Ltd | Microwave plasma processor |
-
1987
- 1987-07-08 JP JP62170668A patent/JPH0612764B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59103340A (en) * | 1983-09-21 | 1984-06-14 | Hitachi Ltd | Plasma processing apparatus |
JPS63122123A (en) * | 1986-11-12 | 1988-05-26 | Hitachi Ltd | Microwave plasma processor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003052807A1 (en) * | 2001-12-14 | 2003-06-26 | Tokyo Electron Limited | Plasma processor |
Also Published As
Publication number | Publication date |
---|---|
JPH0612764B2 (en) | 1994-02-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 14 Free format text: PAYMENT UNTIL: 20080216 |