JPS6414921A - Microwave plasma processor - Google Patents

Microwave plasma processor

Info

Publication number
JPS6414921A
JPS6414921A JP17066887A JP17066887A JPS6414921A JP S6414921 A JPS6414921 A JP S6414921A JP 17066887 A JP17066887 A JP 17066887A JP 17066887 A JP17066887 A JP 17066887A JP S6414921 A JPS6414921 A JP S6414921A
Authority
JP
Japan
Prior art keywords
plasma
microwave
chamber
generating
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17066887A
Other languages
Japanese (ja)
Other versions
JPH0612764B2 (en
Inventor
Sumio Mori
Masami Sasaki
Kiyoushiyoku Kin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP62170668A priority Critical patent/JPH0612764B2/en
Publication of JPS6414921A publication Critical patent/JPS6414921A/en
Publication of JPH0612764B2 publication Critical patent/JPH0612764B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To suppress a reflection wave and to stably introduce a microwave by generating a plasma from gas to be treated by an electron cyclotron resonance phenomenon, and so constructing a microwave plasma processor for irradiating a substrate as to regulate the position of plasma introducing means of the processor. CONSTITUTION:After a substrate processing chamber 8 is reduced under pressure and evacuated, predetermined gas is introduced to maintain it under processing pressure. A microwave is introduced from a microwave generator 3 to a plasma generating chamber 6, a current is supplied from a plasma generating power supply 12 to an air core solenoid coil 7 to generate a magnetic field, thereby generating an electron cyclotron resonance in the chamber 6, and a plasma is generated in high density in the gas. The plasma is introduced from a plasma introduction plate 11 toward the chamber 8, and a thin film is formed on a substrate 10. It is monitored by a power detector 18 through a microwave reflection wave sensor 17 while the plate 11 is being moved, and the plate 11 is stopped when it becomes minimum.
JP62170668A 1987-07-08 1987-07-08 Microwave plasma processing equipment Expired - Lifetime JPH0612764B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62170668A JPH0612764B2 (en) 1987-07-08 1987-07-08 Microwave plasma processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62170668A JPH0612764B2 (en) 1987-07-08 1987-07-08 Microwave plasma processing equipment

Publications (2)

Publication Number Publication Date
JPS6414921A true JPS6414921A (en) 1989-01-19
JPH0612764B2 JPH0612764B2 (en) 1994-02-16

Family

ID=15909160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62170668A Expired - Lifetime JPH0612764B2 (en) 1987-07-08 1987-07-08 Microwave plasma processing equipment

Country Status (1)

Country Link
JP (1) JPH0612764B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003052807A1 (en) * 2001-12-14 2003-06-26 Tokyo Electron Limited Plasma processor

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103340A (en) * 1983-09-21 1984-06-14 Hitachi Ltd Plasma processing apparatus
JPS63122123A (en) * 1986-11-12 1988-05-26 Hitachi Ltd Microwave plasma processor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103340A (en) * 1983-09-21 1984-06-14 Hitachi Ltd Plasma processing apparatus
JPS63122123A (en) * 1986-11-12 1988-05-26 Hitachi Ltd Microwave plasma processor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003052807A1 (en) * 2001-12-14 2003-06-26 Tokyo Electron Limited Plasma processor

Also Published As

Publication number Publication date
JPH0612764B2 (en) 1994-02-16

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