JPS6311658B2 - - Google Patents

Info

Publication number
JPS6311658B2
JPS6311658B2 JP18646984A JP18646984A JPS6311658B2 JP S6311658 B2 JPS6311658 B2 JP S6311658B2 JP 18646984 A JP18646984 A JP 18646984A JP 18646984 A JP18646984 A JP 18646984A JP S6311658 B2 JPS6311658 B2 JP S6311658B2
Authority
JP
Japan
Prior art keywords
glass mask
wafer
contact
support member
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18646984A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6165250A (ja
Inventor
Yoshiharu Nakamura
Yutaka Echizen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59186469A priority Critical patent/JPS6165250A/ja
Publication of JPS6165250A publication Critical patent/JPS6165250A/ja
Publication of JPS6311658B2 publication Critical patent/JPS6311658B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59186469A 1984-09-07 1984-09-07 密着式ガラスマスク Granted JPS6165250A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59186469A JPS6165250A (ja) 1984-09-07 1984-09-07 密着式ガラスマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59186469A JPS6165250A (ja) 1984-09-07 1984-09-07 密着式ガラスマスク

Publications (2)

Publication Number Publication Date
JPS6165250A JPS6165250A (ja) 1986-04-03
JPS6311658B2 true JPS6311658B2 (enrdf_load_stackoverflow) 1988-03-15

Family

ID=16189014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59186469A Granted JPS6165250A (ja) 1984-09-07 1984-09-07 密着式ガラスマスク

Country Status (1)

Country Link
JP (1) JPS6165250A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0854816A (ja) * 1994-08-11 1996-02-27 Nec Corp 印刷装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4266661B2 (ja) * 2003-02-20 2009-05-20 キヤノン株式会社 近接場露光用フォトマスク

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0854816A (ja) * 1994-08-11 1996-02-27 Nec Corp 印刷装置

Also Published As

Publication number Publication date
JPS6165250A (ja) 1986-04-03

Similar Documents

Publication Publication Date Title
KR970059842A (ko) 기판유지장치 및 이를 이용한 노광장치
US5160959A (en) Device and method for the alignment of masks
USH1373H (en) Wafer handling apparatus and method
US6862817B1 (en) Method and apparatus for kinematic registration of a reticle
JP4411100B2 (ja) 露光装置
KR20170114933A (ko) 처리 장치 및 물품의 제조 방법
JPS6311658B2 (enrdf_load_stackoverflow)
JP2750554B2 (ja) 真空吸着装置
US4651009A (en) Contact exposure apparatus
KR20030028985A (ko) 반도체 소자 제조용 장비에서의 웨이퍼 척
US4271577A (en) Alignment device
US6819406B2 (en) Aligner
JP3164629B2 (ja) 半導体ウエハ用真空チャックステージ
JP5495094B2 (ja) コンタクト露光装置及びコンタクト露光方法
JPH0666250B2 (ja) プロキシミテイ露光用マスク装置
KR100771532B1 (ko) 포토마스크 제조장치
JPS62230537A (ja) ２平板分離装置
JP2607193B2 (ja) 露光用マスクの製造方法
JPH06273922A (ja) マスク保護用ペリクル
JPH07271017A (ja) フォトマスク用ペリクル枠
JP2008276040A (ja) マスクステージ
JPH06295057A (ja) ペリクル付ガラスマスク
JPH06258819A (ja) マスク保護用ペリクル
JPH03150863A (ja) ウエハチャック
JPH06342208A (ja) マスク保護用ペリクル