JPS63113458A - レチクル - Google Patents

レチクル

Info

Publication number
JPS63113458A
JPS63113458A JP61259258A JP25925886A JPS63113458A JP S63113458 A JPS63113458 A JP S63113458A JP 61259258 A JP61259258 A JP 61259258A JP 25925886 A JP25925886 A JP 25925886A JP S63113458 A JPS63113458 A JP S63113458A
Authority
JP
Japan
Prior art keywords
pattern
reticle
auxiliary
blocks
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61259258A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349219B2 (enrdf_load_stackoverflow
Inventor
Izumi Tanaka
泉 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61259258A priority Critical patent/JPS63113458A/ja
Publication of JPS63113458A publication Critical patent/JPS63113458A/ja
Publication of JPS6349219B2 publication Critical patent/JPS6349219B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61259258A 1986-10-30 1986-10-30 レチクル Granted JPS63113458A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61259258A JPS63113458A (ja) 1986-10-30 1986-10-30 レチクル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61259258A JPS63113458A (ja) 1986-10-30 1986-10-30 レチクル

Publications (2)

Publication Number Publication Date
JPS63113458A true JPS63113458A (ja) 1988-05-18
JPS6349219B2 JPS6349219B2 (enrdf_load_stackoverflow) 1988-10-04

Family

ID=17331605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61259258A Granted JPS63113458A (ja) 1986-10-30 1986-10-30 レチクル

Country Status (1)

Country Link
JP (1) JPS63113458A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6349219B2 (enrdf_load_stackoverflow) 1988-10-04

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