JPS629714Y2 - - Google Patents
Info
- Publication number
- JPS629714Y2 JPS629714Y2 JP18218078U JP18218078U JPS629714Y2 JP S629714 Y2 JPS629714 Y2 JP S629714Y2 JP 18218078 U JP18218078 U JP 18218078U JP 18218078 U JP18218078 U JP 18218078U JP S629714 Y2 JPS629714 Y2 JP S629714Y2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist film
- substrate
- reaction tube
- polymer compound
- reaction container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 28
- 229920002120 photoresistant polymer Polymers 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000001179 sorption measurement Methods 0.000 claims description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 229910001120 nichrome Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000006552 photochemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18218078U JPS629714Y2 (enrdf_load_stackoverflow) | 1978-12-28 | 1978-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18218078U JPS629714Y2 (enrdf_load_stackoverflow) | 1978-12-28 | 1978-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5599144U JPS5599144U (enrdf_load_stackoverflow) | 1980-07-10 |
| JPS629714Y2 true JPS629714Y2 (enrdf_load_stackoverflow) | 1987-03-06 |
Family
ID=29193859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18218078U Expired JPS629714Y2 (enrdf_load_stackoverflow) | 1978-12-28 | 1978-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS629714Y2 (enrdf_load_stackoverflow) |
-
1978
- 1978-12-28 JP JP18218078U patent/JPS629714Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5599144U (enrdf_load_stackoverflow) | 1980-07-10 |
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