JPS6126648B2 - - Google Patents

Info

Publication number
JPS6126648B2
JPS6126648B2 JP16479878A JP16479878A JPS6126648B2 JP S6126648 B2 JPS6126648 B2 JP S6126648B2 JP 16479878 A JP16479878 A JP 16479878A JP 16479878 A JP16479878 A JP 16479878A JP S6126648 B2 JPS6126648 B2 JP S6126648B2
Authority
JP
Japan
Prior art keywords
photoresist film
reaction tube
compound
reaction
ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16479878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5589833A (en
Inventor
Kazuo Toda
Ryuichi Ogawa
Shuzo Ooshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16479878A priority Critical patent/JPS5589833A/ja
Publication of JPS5589833A publication Critical patent/JPS5589833A/ja
Publication of JPS6126648B2 publication Critical patent/JPS6126648B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16479878A 1978-12-28 1978-12-28 Photoresist film forming method Granted JPS5589833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16479878A JPS5589833A (en) 1978-12-28 1978-12-28 Photoresist film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16479878A JPS5589833A (en) 1978-12-28 1978-12-28 Photoresist film forming method

Publications (2)

Publication Number Publication Date
JPS5589833A JPS5589833A (en) 1980-07-07
JPS6126648B2 true JPS6126648B2 (enrdf_load_stackoverflow) 1986-06-21

Family

ID=15800127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16479878A Granted JPS5589833A (en) 1978-12-28 1978-12-28 Photoresist film forming method

Country Status (1)

Country Link
JP (1) JPS5589833A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5589833A (en) 1980-07-07

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