JPS629302Y2 - - Google Patents
Info
- Publication number
- JPS629302Y2 JPS629302Y2 JP12160982U JP12160982U JPS629302Y2 JP S629302 Y2 JPS629302 Y2 JP S629302Y2 JP 12160982 U JP12160982 U JP 12160982U JP 12160982 U JP12160982 U JP 12160982U JP S629302 Y2 JPS629302 Y2 JP S629302Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- reaction chamber
- processing apparatus
- processing
- exhaust port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012545 processing Methods 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000004743 Polypropylene Substances 0.000 description 9
- 229920001155 polypropylene Polymers 0.000 description 9
- 238000009832 plasma treatment Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 230000036470 plasma concentration Effects 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12160982U JPS5928535U (ja) | 1982-08-12 | 1982-08-12 | プラズマ処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12160982U JPS5928535U (ja) | 1982-08-12 | 1982-08-12 | プラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5928535U JPS5928535U (ja) | 1984-02-22 |
JPS629302Y2 true JPS629302Y2 (fr) | 1987-03-04 |
Family
ID=30278261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12160982U Granted JPS5928535U (ja) | 1982-08-12 | 1982-08-12 | プラズマ処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5928535U (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0348194Y2 (fr) * | 1985-04-30 | 1991-10-15 |
-
1982
- 1982-08-12 JP JP12160982U patent/JPS5928535U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5928535U (ja) | 1984-02-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI647757B (zh) | 具有離子加速器之雙腔室電漿蝕刻器 | |
US20180102259A1 (en) | Cobalt-containing material removal | |
KR20150101927A (ko) | 플라즈마 처리 장치의 클리닝 방법 | |
KR19980064042A (ko) | 씨브이디성막방법 | |
JPH0666298B2 (ja) | ドライエッチング装置 | |
KR19980087321A (ko) | 고속 소프트 배기 방법 및 장치 | |
US10770300B2 (en) | Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity | |
US4678644A (en) | Apparatus and method for plasma treatment of resin material | |
JPS629302Y2 (fr) | ||
EP0117541B1 (fr) | Appareil pour le traitement par plasma de matériau résineux | |
JPS6021382A (ja) | プラズマcvd装置 | |
JPS5920332A (ja) | プラズマ処理を施す方法および装置 | |
EP0152511B1 (fr) | Dispositif et procédé pour le traitement au plasma de matière plastique | |
JPH033700B2 (fr) | ||
US4690097A (en) | Apparatus and method for plasma treatment of resin material | |
JPS58208326A (ja) | プラズマ処理方法 | |
US20060231207A1 (en) | System and method for surface treatment | |
JPS5986630A (ja) | プラズマ処理を施す方法および装置 | |
CN112391607A (zh) | 成膜方法和成膜装置 | |
US4786522A (en) | Method for plasma treatment of resin material | |
JPS63100181A (ja) | 表面処理装置 | |
JPH0495B2 (fr) | ||
EP0326191A2 (fr) | Appareil et méthode pour le traitement par plasma de matériau résineux | |
JPS59189130A (ja) | プラズマ処理方法 | |
WO2021109425A1 (fr) | Équipement de revêtement |