JPS629189B2 - - Google Patents

Info

Publication number
JPS629189B2
JPS629189B2 JP57000997A JP99782A JPS629189B2 JP S629189 B2 JPS629189 B2 JP S629189B2 JP 57000997 A JP57000997 A JP 57000997A JP 99782 A JP99782 A JP 99782A JP S629189 B2 JPS629189 B2 JP S629189B2
Authority
JP
Japan
Prior art keywords
vapor deposition
photochemical reaction
deposition
tank
ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57000997A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58119334A (ja
Inventor
Satoru Takemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP99782A priority Critical patent/JPS58119334A/ja
Publication of JPS58119334A publication Critical patent/JPS58119334A/ja
Publication of JPS629189B2 publication Critical patent/JPS629189B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP99782A 1982-01-08 1982-01-08 光化学反応蒸着方法 Granted JPS58119334A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP99782A JPS58119334A (ja) 1982-01-08 1982-01-08 光化学反応蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP99782A JPS58119334A (ja) 1982-01-08 1982-01-08 光化学反応蒸着方法

Publications (2)

Publication Number Publication Date
JPS58119334A JPS58119334A (ja) 1983-07-15
JPS629189B2 true JPS629189B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-02-26

Family

ID=11489228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP99782A Granted JPS58119334A (ja) 1982-01-08 1982-01-08 光化学反応蒸着方法

Country Status (1)

Country Link
JP (1) JPS58119334A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043484A (ja) * 1983-08-19 1985-03-08 Mitsui Toatsu Chem Inc 広いバンドギヤツプを有するアモルフアスシリコン膜の形成方法
JPS6199676A (ja) * 1984-10-19 1986-05-17 Semiconductor Energy Lab Co Ltd 窒化珪素作製方法
JPH06104901B2 (ja) * 1986-03-07 1994-12-21 日本電気株式会社 光ｃｖｄ方法
JPS6274084A (ja) * 1985-09-27 1987-04-04 Sanyo Electric Co Ltd 周期構造膜の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4181751A (en) * 1978-05-24 1980-01-01 Hughes Aircraft Company Process for the preparation of low temperature silicon nitride films by photochemical vapor deposition

Also Published As

Publication number Publication date
JPS58119334A (ja) 1983-07-15

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