JPS628939B2 - - Google Patents

Info

Publication number
JPS628939B2
JPS628939B2 JP54018821A JP1882179A JPS628939B2 JP S628939 B2 JPS628939 B2 JP S628939B2 JP 54018821 A JP54018821 A JP 54018821A JP 1882179 A JP1882179 A JP 1882179A JP S628939 B2 JPS628939 B2 JP S628939B2
Authority
JP
Japan
Prior art keywords
epitaxial layer
region
film
oxide film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54018821A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55111144A (en
Inventor
Kunio Aomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP1882179A priority Critical patent/JPS55111144A/ja
Publication of JPS55111144A publication Critical patent/JPS55111144A/ja
Publication of JPS628939B2 publication Critical patent/JPS628939B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP1882179A 1979-02-20 1979-02-20 Manufacturing method of semiconductor device Granted JPS55111144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1882179A JPS55111144A (en) 1979-02-20 1979-02-20 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1882179A JPS55111144A (en) 1979-02-20 1979-02-20 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS55111144A JPS55111144A (en) 1980-08-27
JPS628939B2 true JPS628939B2 (cs) 1987-02-25

Family

ID=11982220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1882179A Granted JPS55111144A (en) 1979-02-20 1979-02-20 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS55111144A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5877241A (ja) * 1981-11-02 1983-05-10 Nec Corp 半導体集積回路装置
JPS60111466A (ja) * 1983-11-22 1985-06-17 Shindengen Electric Mfg Co Ltd 半導体装置の製造方法
JPH05159180A (ja) * 1991-12-09 1993-06-25 Hitachi Electron Service Co Ltd 分電盤内の配線保護方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583039B2 (ja) * 1975-06-30 1983-01-19 松下電工株式会社 フクゴウメツキホウ

Also Published As

Publication number Publication date
JPS55111144A (en) 1980-08-27

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