JPS627974B2 - - Google Patents

Info

Publication number
JPS627974B2
JPS627974B2 JP52012866A JP1286677A JPS627974B2 JP S627974 B2 JPS627974 B2 JP S627974B2 JP 52012866 A JP52012866 A JP 52012866A JP 1286677 A JP1286677 A JP 1286677A JP S627974 B2 JPS627974 B2 JP S627974B2
Authority
JP
Japan
Prior art keywords
electron beam
sample
scanning
ray
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52012866A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5397895A (en
Inventor
Kyoshi Harasawa
Shojiro Tagata
Jun Suzumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP1286677A priority Critical patent/JPS5397895A/ja
Publication of JPS5397895A publication Critical patent/JPS5397895A/ja
Publication of JPS627974B2 publication Critical patent/JPS627974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP1286677A 1977-02-08 1977-02-08 X-ray analyzer Granted JPS5397895A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1286677A JPS5397895A (en) 1977-02-08 1977-02-08 X-ray analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1286677A JPS5397895A (en) 1977-02-08 1977-02-08 X-ray analyzer

Publications (2)

Publication Number Publication Date
JPS5397895A JPS5397895A (en) 1978-08-26
JPS627974B2 true JPS627974B2 (fr) 1987-02-20

Family

ID=11817325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1286677A Granted JPS5397895A (en) 1977-02-08 1977-02-08 X-ray analyzer

Country Status (1)

Country Link
JP (1) JPS5397895A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6076652A (ja) * 1983-09-30 1985-05-01 Shimadzu Corp 走査x線像の形成方法

Also Published As

Publication number Publication date
JPS5397895A (en) 1978-08-26

Similar Documents

Publication Publication Date Title
US4814615A (en) Method and apparatus for detecting defect in circuit pattern of a mask for X-ray exposure
JP3231516B2 (ja) 電子線マイクロアナライザ
US4382182A (en) Method of displaying an image of phase contrast in a scanning transmission electron microscope
JP3780620B2 (ja) 電子分光器及びそれを備えた透過型電子顕微鏡
JPS627974B2 (fr)
JPH071688B2 (ja) 走査型反射電子回折顕微鏡
US5895916A (en) Method and apparatus for adjusting electron beam apparatus
JPS5811569B2 (ja) デンシブンコウソウチ
JPH0119804Y2 (fr)
JPS633258B2 (fr)
JPH1167138A (ja) 微小領域観察装置
JPH10213556A (ja) 表面元素分析装置及び分析方法
JPS61269842A (ja) 電子顕微鏡
JP2023054559A (ja) 画像表示方法、分析システムおよびプログラム
JP3535187B2 (ja) エネルギー分析装置
JPS61250952A (ja) 電子顕微鏡
JPS62167452A (ja) X線光電子分光装置
KR830002115B1 (ko) 입자선을 사용한 시료분석 장치
JP2502050B2 (ja) 電子線マイクロアナライザ
JPH01274050A (ja) X線光電子分析装置
JPH03176955A (ja) 走査形電子ビーム装置
JPS61151959A (ja) 走査型電子顕微鏡
JPS58200144A (ja) X線光電子分光装置
JPH10241617A (ja) 電子線マイクロアナライザ
JPH0782828B2 (ja) 微小部分分析装置