JPS627857A - 真空蒸着用溶融金属の吹出防止方法 - Google Patents

真空蒸着用溶融金属の吹出防止方法

Info

Publication number
JPS627857A
JPS627857A JP14448385A JP14448385A JPS627857A JP S627857 A JPS627857 A JP S627857A JP 14448385 A JP14448385 A JP 14448385A JP 14448385 A JP14448385 A JP 14448385A JP S627857 A JPS627857 A JP S627857A
Authority
JP
Japan
Prior art keywords
jacket
pressure
molten metal
metal
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14448385A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328511B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Takehiko Ito
武彦 伊藤
Takuya Aiko
愛甲 琢哉
Yoshiteru Moriyama
森山 義輝
Koji Nakanishi
康二 中西
Kanji Wake
和気 完治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP14448385A priority Critical patent/JPS627857A/ja
Publication of JPS627857A publication Critical patent/JPS627857A/ja
Publication of JPH0328511B2 publication Critical patent/JPH0328511B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP14448385A 1985-07-03 1985-07-03 真空蒸着用溶融金属の吹出防止方法 Granted JPS627857A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14448385A JPS627857A (ja) 1985-07-03 1985-07-03 真空蒸着用溶融金属の吹出防止方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14448385A JPS627857A (ja) 1985-07-03 1985-07-03 真空蒸着用溶融金属の吹出防止方法

Publications (2)

Publication Number Publication Date
JPS627857A true JPS627857A (ja) 1987-01-14
JPH0328511B2 JPH0328511B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-19

Family

ID=15363363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14448385A Granted JPS627857A (ja) 1985-07-03 1985-07-03 真空蒸着用溶融金属の吹出防止方法

Country Status (1)

Country Link
JP (1) JPS627857A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450011U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1990-09-04 1992-04-27
JPH051404U (ja) * 1991-06-26 1993-01-14 株式会社貝印刃物開発センター 爪切り及びt型剃刀及び替刃式メス
WO2008040329A1 (de) * 2006-09-29 2008-04-10 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsverfahren und anordnung zur durchführung des verfahrens
US20230152612A1 (en) * 2020-08-07 2023-05-18 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Reflection rate detection device and reflection rate detection method for liquid crystal panel

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450011U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1990-09-04 1992-04-27
JPH051404U (ja) * 1991-06-26 1993-01-14 株式会社貝印刃物開発センター 爪切り及びt型剃刀及び替刃式メス
WO2008040329A1 (de) * 2006-09-29 2008-04-10 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsverfahren und anordnung zur durchführung des verfahrens
US20230152612A1 (en) * 2020-08-07 2023-05-18 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Reflection rate detection device and reflection rate detection method for liquid crystal panel

Also Published As

Publication number Publication date
JPH0328511B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-19

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