JPS6274072A - 薄膜形成装置 - Google Patents

薄膜形成装置

Info

Publication number
JPS6274072A
JPS6274072A JP21416785A JP21416785A JPS6274072A JP S6274072 A JPS6274072 A JP S6274072A JP 21416785 A JP21416785 A JP 21416785A JP 21416785 A JP21416785 A JP 21416785A JP S6274072 A JPS6274072 A JP S6274072A
Authority
JP
Japan
Prior art keywords
substrates
shutter
targets
thin film
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21416785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS642188B2 (enrdf_load_stackoverflow
Inventor
Hidetsugu Setoyama
英嗣 瀬戸山
Shinzo Oikawa
及川　新三
Kenichi Kizawa
賢一 鬼沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP21416785A priority Critical patent/JPS6274072A/ja
Publication of JPS6274072A publication Critical patent/JPS6274072A/ja
Publication of JPS642188B2 publication Critical patent/JPS642188B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP21416785A 1985-09-27 1985-09-27 薄膜形成装置 Granted JPS6274072A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21416785A JPS6274072A (ja) 1985-09-27 1985-09-27 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21416785A JPS6274072A (ja) 1985-09-27 1985-09-27 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS6274072A true JPS6274072A (ja) 1987-04-04
JPS642188B2 JPS642188B2 (enrdf_load_stackoverflow) 1989-01-13

Family

ID=16651341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21416785A Granted JPS6274072A (ja) 1985-09-27 1985-09-27 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS6274072A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6869483B2 (en) * 1998-03-21 2005-03-22 Joachim Sacher Coating process and apparatus
KR101214881B1 (ko) 2004-03-12 2012-12-24 캐논 아네르바 가부시키가이샤 다원 스퍼터링 장치의 이중 셔터 제어 방법
WO2014083727A1 (ja) * 2012-11-30 2014-06-05 キヤノンアネルバ株式会社 スパッタリング装置および基板処理装置
US10062551B2 (en) 2012-11-30 2018-08-28 Canon Anelva Corporation Sputtering apparatus and substrate processing apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6869483B2 (en) * 1998-03-21 2005-03-22 Joachim Sacher Coating process and apparatus
KR101214881B1 (ko) 2004-03-12 2012-12-24 캐논 아네르바 가부시키가이샤 다원 스퍼터링 장치의 이중 셔터 제어 방법
WO2014083727A1 (ja) * 2012-11-30 2014-06-05 キヤノンアネルバ株式会社 スパッタリング装置および基板処理装置
JP5922795B2 (ja) * 2012-11-30 2016-05-24 キヤノンアネルバ株式会社 スパッタリング装置および基板処理装置
CN104812933B (zh) * 2012-11-30 2017-03-08 佳能安内华股份有限公司 溅镀装置及基板处理装置
US9997339B2 (en) 2012-11-30 2018-06-12 Canon Anelva Corporation Sputtering apparatus and substrate processing apparatus
US10062551B2 (en) 2012-11-30 2018-08-28 Canon Anelva Corporation Sputtering apparatus and substrate processing apparatus
US10615012B2 (en) 2012-11-30 2020-04-07 Canon Anelva Corporation Sputtering apparatus and substrate processing apparatus

Also Published As

Publication number Publication date
JPS642188B2 (enrdf_load_stackoverflow) 1989-01-13

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