JPS627266B2 - - Google Patents
Info
- Publication number
- JPS627266B2 JPS627266B2 JP1895878A JP1895878A JPS627266B2 JP S627266 B2 JPS627266 B2 JP S627266B2 JP 1895878 A JP1895878 A JP 1895878A JP 1895878 A JP1895878 A JP 1895878A JP S627266 B2 JPS627266 B2 JP S627266B2
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- value
- spectral
- thin film
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 18
- 230000003595 spectral effect Effects 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 8
- 238000002834 transmittance Methods 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 description 8
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000005375 photometry Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000572 ellipsometry Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Filters (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Insulating Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1895878A JPS54110938A (en) | 1978-02-20 | 1978-02-20 | Method and apparatus for controlling film thickness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1895878A JPS54110938A (en) | 1978-02-20 | 1978-02-20 | Method and apparatus for controlling film thickness |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54110938A JPS54110938A (en) | 1979-08-30 |
| JPS627266B2 true JPS627266B2 (th) | 1987-02-16 |
Family
ID=11986145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1895878A Granted JPS54110938A (en) | 1978-02-20 | 1978-02-20 | Method and apparatus for controlling film thickness |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54110938A (th) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH026989U (th) * | 1988-06-27 | 1990-01-17 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2538005B1 (fr) * | 1982-12-17 | 1987-06-12 | Solvay | Cathode pour la production electrolytique d'hydrogene et son utilisation |
| RU2006136761A (ru) * | 2006-10-18 | 2008-04-27 | ФГОУ ВПО Российский государственный университет имени Иммануила Канта (РГУ им. И. Канта) (RU) | Способ контроля толщины пленки в процессе ее нанесения осаждением в вакуумной камере |
-
1978
- 1978-02-20 JP JP1895878A patent/JPS54110938A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH026989U (th) * | 1988-06-27 | 1990-01-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54110938A (en) | 1979-08-30 |
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