JPS6270550A - タ−ゲツト材 - Google Patents

タ−ゲツト材

Info

Publication number
JPS6270550A
JPS6270550A JP60208098A JP20809885A JPS6270550A JP S6270550 A JPS6270550 A JP S6270550A JP 60208098 A JP60208098 A JP 60208098A JP 20809885 A JP20809885 A JP 20809885A JP S6270550 A JPS6270550 A JP S6270550A
Authority
JP
Japan
Prior art keywords
target material
rare earth
iron group
sputtering
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60208098A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0549730B2 (enrdf_load_stackoverflow
Inventor
Kenichi Hijikata
土方　研一
Kazuyuki Sato
一幸 佐藤
Hitoshi Maruyama
仁 丸山
Riyouko Furuhashi
古橋　亮子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP60208098A priority Critical patent/JPS6270550A/ja
Publication of JPS6270550A publication Critical patent/JPS6270550A/ja
Publication of JPH0549730B2 publication Critical patent/JPH0549730B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Powder Metallurgy (AREA)
JP60208098A 1985-09-20 1985-09-20 タ−ゲツト材 Granted JPS6270550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60208098A JPS6270550A (ja) 1985-09-20 1985-09-20 タ−ゲツト材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60208098A JPS6270550A (ja) 1985-09-20 1985-09-20 タ−ゲツト材

Publications (2)

Publication Number Publication Date
JPS6270550A true JPS6270550A (ja) 1987-04-01
JPH0549730B2 JPH0549730B2 (enrdf_load_stackoverflow) 1993-07-27

Family

ID=16550601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60208098A Granted JPS6270550A (ja) 1985-09-20 1985-09-20 タ−ゲツト材

Country Status (1)

Country Link
JP (1) JPS6270550A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118028A (ja) * 1986-11-06 1988-05-23 Hitachi Metals Ltd 希土類元素−遷移金属元素タ−ゲツト及びその製造方法
JPS63250429A (ja) * 1987-04-06 1988-10-18 Seiko Instr & Electronics Ltd イツテルビウム−遷移金属系合金の製造方法
JPS6425977A (en) * 1987-04-20 1989-01-27 Hitachi Metals Ltd Alloy powder of rare earth metal-iron group metal target, rare earth metal-iron group metal target and production thereof
EP0308201A1 (en) * 1987-09-17 1989-03-22 Seiko Epson Corporation Method of forming a sputtering target for use in producing a magneto-optic recording medium
US4824481A (en) * 1988-01-11 1989-04-25 Eaastman Kodak Company Sputtering targets for magneto-optic films and a method for making
US5439500A (en) * 1993-12-02 1995-08-08 Materials Research Corporation Magneto-optical alloy sputter targets
US8430978B2 (en) 2003-08-05 2013-04-30 Jx Nippon Mining & Metals Corporation Sputtering target and method for production thereof
US8663439B2 (en) 2004-11-15 2014-03-04 Jx Nippon Mining & Metals Corporation Sputtering target for producing metallic glass membrane and manufacturing method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61139637A (ja) * 1984-12-12 1986-06-26 Hitachi Metals Ltd スパツタ用タ−ゲツトとその製造方法
JPS61229314A (ja) * 1985-04-03 1986-10-13 Hitachi Metals Ltd タ−ゲツト材料およびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61139637A (ja) * 1984-12-12 1986-06-26 Hitachi Metals Ltd スパツタ用タ−ゲツトとその製造方法
JPS61229314A (ja) * 1985-04-03 1986-10-13 Hitachi Metals Ltd タ−ゲツト材料およびその製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118028A (ja) * 1986-11-06 1988-05-23 Hitachi Metals Ltd 希土類元素−遷移金属元素タ−ゲツト及びその製造方法
JPS63250429A (ja) * 1987-04-06 1988-10-18 Seiko Instr & Electronics Ltd イツテルビウム−遷移金属系合金の製造方法
JPS6425977A (en) * 1987-04-20 1989-01-27 Hitachi Metals Ltd Alloy powder of rare earth metal-iron group metal target, rare earth metal-iron group metal target and production thereof
US4957549A (en) * 1987-04-20 1990-09-18 Hitachi Metals, Ltd. Rare earth metal-iron group metal target, alloy powder therefor and method of producing same
US5062885A (en) * 1987-04-20 1991-11-05 Hitachi Metals, Ltd. Rare earth metal-iron group metal target, alloy powder therefor and method of producing same
US5098649A (en) * 1987-04-20 1992-03-24 Hitachi Metals, Ltd. Rare earth metal-iron group metal target, alloy powder therefor and method of producing same
EP0308201A1 (en) * 1987-09-17 1989-03-22 Seiko Epson Corporation Method of forming a sputtering target for use in producing a magneto-optic recording medium
US4824481A (en) * 1988-01-11 1989-04-25 Eaastman Kodak Company Sputtering targets for magneto-optic films and a method for making
US5439500A (en) * 1993-12-02 1995-08-08 Materials Research Corporation Magneto-optical alloy sputter targets
US8430978B2 (en) 2003-08-05 2013-04-30 Jx Nippon Mining & Metals Corporation Sputtering target and method for production thereof
US8663439B2 (en) 2004-11-15 2014-03-04 Jx Nippon Mining & Metals Corporation Sputtering target for producing metallic glass membrane and manufacturing method thereof

Also Published As

Publication number Publication date
JPH0549730B2 (enrdf_load_stackoverflow) 1993-07-27

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees