JPS6269534A - 平坦性薄膜の形成方法 - Google Patents

平坦性薄膜の形成方法

Info

Publication number
JPS6269534A
JPS6269534A JP60209741A JP20974185A JPS6269534A JP S6269534 A JPS6269534 A JP S6269534A JP 60209741 A JP60209741 A JP 60209741A JP 20974185 A JP20974185 A JP 20974185A JP S6269534 A JPS6269534 A JP S6269534A
Authority
JP
Japan
Prior art keywords
thin film
film
forming
charged particles
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60209741A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0237092B2 (enExample
Inventor
Kazuyoshi Kamoshita
鴨志田　和良
Hiroaki Nakamura
宏昭 中村
Takao Amasawa
天沢　敬生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60209741A priority Critical patent/JPS6269534A/ja
Priority to DE3650612T priority patent/DE3650612T2/de
Priority to DE3689388T priority patent/DE3689388T2/de
Priority to CA000508851A priority patent/CA1247464A/en
Priority to EP86106432A priority patent/EP0202572B1/en
Priority to KR1019860003683A priority patent/KR900005785B1/ko
Priority to EP93102886A priority patent/EP0544648B1/en
Publication of JPS6269534A publication Critical patent/JPS6269534A/ja
Priority to US07/075,208 priority patent/US4816126A/en
Publication of JPH0237092B2 publication Critical patent/JPH0237092B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP60209741A 1985-05-13 1985-09-20 平坦性薄膜の形成方法 Granted JPS6269534A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP60209741A JPS6269534A (ja) 1985-09-20 1985-09-20 平坦性薄膜の形成方法
DE3650612T DE3650612T2 (de) 1985-05-13 1986-05-12 Verfahren zur Planarisierung einer dünnen Al-Schicht
DE3689388T DE3689388T2 (de) 1985-05-13 1986-05-12 Verfahren zur Herstellung einer planierten Dünnschicht aus Aluminium.
CA000508851A CA1247464A (en) 1985-05-13 1986-05-12 Method for forming a planarized thin film
EP86106432A EP0202572B1 (en) 1985-05-13 1986-05-12 Method for forming a planarized aluminium thin film
KR1019860003683A KR900005785B1 (ko) 1985-05-13 1986-05-12 평탄성 박막의 제조방법
EP93102886A EP0544648B1 (en) 1985-05-13 1986-05-12 Method for forming a planarized Al thin film
US07/075,208 US4816126A (en) 1985-05-13 1987-07-20 Method for forming a planarized thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60209741A JPS6269534A (ja) 1985-09-20 1985-09-20 平坦性薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS6269534A true JPS6269534A (ja) 1987-03-30
JPH0237092B2 JPH0237092B2 (enExample) 1990-08-22

Family

ID=16577868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60209741A Granted JPS6269534A (ja) 1985-05-13 1985-09-20 平坦性薄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS6269534A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5723367A (en) * 1993-11-16 1998-03-03 Kabushiki Kaisha Toshiba Wiring forming method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5810838A (ja) * 1981-07-14 1983-01-21 Fujitsu Ltd 半導体装置の製造方法
JPS58115835A (ja) * 1981-12-28 1983-07-09 Fujitsu Ltd 半導体装置の埋込配線形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5810838A (ja) * 1981-07-14 1983-01-21 Fujitsu Ltd 半導体装置の製造方法
JPS58115835A (ja) * 1981-12-28 1983-07-09 Fujitsu Ltd 半導体装置の埋込配線形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5723367A (en) * 1993-11-16 1998-03-03 Kabushiki Kaisha Toshiba Wiring forming method

Also Published As

Publication number Publication date
JPH0237092B2 (enExample) 1990-08-22

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