JPS6261256A - イオンビ−ムにおける偏向歪の修正方法とこの方法に使用する偏向歪検出素子 - Google Patents
イオンビ−ムにおける偏向歪の修正方法とこの方法に使用する偏向歪検出素子Info
- Publication number
- JPS6261256A JPS6261256A JP60200651A JP20065185A JPS6261256A JP S6261256 A JPS6261256 A JP S6261256A JP 60200651 A JP60200651 A JP 60200651A JP 20065185 A JP20065185 A JP 20065185A JP S6261256 A JPS6261256 A JP S6261256A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- distortion
- deflection
- deflective
- detection element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 66
- 238000000034 method Methods 0.000 title claims description 10
- 238000001514 detection method Methods 0.000 claims description 33
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims 1
- 238000003384 imaging method Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 241000244186 Ascaris Species 0.000 description 2
- 241000244203 Caenorhabditis elegans Species 0.000 description 2
- 241000244206 Nematoda Species 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000002650 habitual effect Effects 0.000 description 2
- 238000002164 ion-beam lithography Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 241000226585 Antennaria plantaginifolia Species 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000276 sedentary effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 210000000689 upper leg Anatomy 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 210000001177 vas deferen Anatomy 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60200651A JPS6261256A (ja) | 1985-09-12 | 1985-09-12 | イオンビ−ムにおける偏向歪の修正方法とこの方法に使用する偏向歪検出素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60200651A JPS6261256A (ja) | 1985-09-12 | 1985-09-12 | イオンビ−ムにおける偏向歪の修正方法とこの方法に使用する偏向歪検出素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6261256A true JPS6261256A (ja) | 1987-03-17 |
| JPH0533496B2 JPH0533496B2 (enExample) | 1993-05-19 |
Family
ID=16427945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60200651A Granted JPS6261256A (ja) | 1985-09-12 | 1985-09-12 | イオンビ−ムにおける偏向歪の修正方法とこの方法に使用する偏向歪検出素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6261256A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0249340A (ja) * | 1987-10-30 | 1990-02-19 | Nano Quest Canada Inc | 走査型電子顕微鏡の倍率調節装置 |
| JP2010205447A (ja) * | 2009-02-27 | 2010-09-16 | Kobe Steel Ltd | イオン源におけるビーム照射電極の被膜除去装置、これを備えたイオン源、及びビーム照射電極の被膜除去用部材 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55112059A (en) * | 1979-02-22 | 1980-08-29 | Nec Corp | Clock extracting circuit |
| JPS56112059A (en) * | 1980-02-08 | 1981-09-04 | Jeol Ltd | Electron beam device |
| JPS56124234A (en) * | 1980-03-05 | 1981-09-29 | Hitachi Ltd | Correcting method for electron beam deflection |
-
1985
- 1985-09-12 JP JP60200651A patent/JPS6261256A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55112059A (en) * | 1979-02-22 | 1980-08-29 | Nec Corp | Clock extracting circuit |
| JPS56112059A (en) * | 1980-02-08 | 1981-09-04 | Jeol Ltd | Electron beam device |
| JPS56124234A (en) * | 1980-03-05 | 1981-09-29 | Hitachi Ltd | Correcting method for electron beam deflection |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0249340A (ja) * | 1987-10-30 | 1990-02-19 | Nano Quest Canada Inc | 走査型電子顕微鏡の倍率調節装置 |
| JP2010205447A (ja) * | 2009-02-27 | 2010-09-16 | Kobe Steel Ltd | イオン源におけるビーム照射電極の被膜除去装置、これを備えたイオン源、及びビーム照射電極の被膜除去用部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0533496B2 (enExample) | 1993-05-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |