JPS6260698B2 - - Google Patents

Info

Publication number
JPS6260698B2
JPS6260698B2 JP24131183A JP24131183A JPS6260698B2 JP S6260698 B2 JPS6260698 B2 JP S6260698B2 JP 24131183 A JP24131183 A JP 24131183A JP 24131183 A JP24131183 A JP 24131183A JP S6260698 B2 JPS6260698 B2 JP S6260698B2
Authority
JP
Japan
Prior art keywords
work
pattern
film
guide hole
work film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP24131183A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60133451A (ja
Inventor
Hiroshi Takashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58241311A priority Critical patent/JPS60133451A/ja
Publication of JPS60133451A publication Critical patent/JPS60133451A/ja
Publication of JPS6260698B2 publication Critical patent/JPS6260698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58241311A 1983-12-21 1983-12-21 ホトマスクのパタ−ン位置の検査方式 Granted JPS60133451A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58241311A JPS60133451A (ja) 1983-12-21 1983-12-21 ホトマスクのパタ−ン位置の検査方式

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58241311A JPS60133451A (ja) 1983-12-21 1983-12-21 ホトマスクのパタ−ン位置の検査方式

Publications (2)

Publication Number Publication Date
JPS60133451A JPS60133451A (ja) 1985-07-16
JPS6260698B2 true JPS6260698B2 (enrdf_load_stackoverflow) 1987-12-17

Family

ID=17072398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58241311A Granted JPS60133451A (ja) 1983-12-21 1983-12-21 ホトマスクのパタ−ン位置の検査方式

Country Status (1)

Country Link
JP (1) JPS60133451A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2523901B2 (ja) * 1989-11-01 1996-08-14 松下電器産業株式会社 パタ―ン検査方法

Also Published As

Publication number Publication date
JPS60133451A (ja) 1985-07-16

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