JPS6260418B2 - - Google Patents

Info

Publication number
JPS6260418B2
JPS6260418B2 JP17900683A JP17900683A JPS6260418B2 JP S6260418 B2 JPS6260418 B2 JP S6260418B2 JP 17900683 A JP17900683 A JP 17900683A JP 17900683 A JP17900683 A JP 17900683A JP S6260418 B2 JPS6260418 B2 JP S6260418B2
Authority
JP
Japan
Prior art keywords
formula
general formula
solution
polymer
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17900683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6071657A (ja
Inventor
Shoji Watanabe
Shohei Kosakai
Masao Kato
Kunihiro Ichimura
Masao Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP17900683A priority Critical patent/JPS6071657A/ja
Publication of JPS6071657A publication Critical patent/JPS6071657A/ja
Publication of JPS6260418B2 publication Critical patent/JPS6260418B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP17900683A 1983-09-27 1983-09-27 感光性樹脂組成物 Granted JPS6071657A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17900683A JPS6071657A (ja) 1983-09-27 1983-09-27 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17900683A JPS6071657A (ja) 1983-09-27 1983-09-27 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6071657A JPS6071657A (ja) 1985-04-23
JPS6260418B2 true JPS6260418B2 (enExample) 1987-12-16

Family

ID=16058463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17900683A Granted JPS6071657A (ja) 1983-09-27 1983-09-27 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6071657A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8333901D0 (en) * 1983-12-20 1984-02-01 Minnesota Mining & Mfg Radiationsensitive compositions
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
DE3766315D1 (de) * 1986-08-06 1991-01-03 Ciba Geigy Ag Negativ-photoresist auf basis von polyphenolen und epoxidverbindungen oder vinylethern.
US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
JPH04330445A (ja) * 1991-02-08 1992-11-18 Fuji Photo Film Co Ltd 光重合性組成物
TW339421B (en) * 1994-09-12 1998-09-01 Sumitomo Kagaku Kk A photoresist composition comprising a polyfunctional vinyl ether compound

Also Published As

Publication number Publication date
JPS6071657A (ja) 1985-04-23

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