JPS6259894B2 - - Google Patents

Info

Publication number
JPS6259894B2
JPS6259894B2 JP57024579A JP2457982A JPS6259894B2 JP S6259894 B2 JPS6259894 B2 JP S6259894B2 JP 57024579 A JP57024579 A JP 57024579A JP 2457982 A JP2457982 A JP 2457982A JP S6259894 B2 JPS6259894 B2 JP S6259894B2
Authority
JP
Japan
Prior art keywords
cdse
film
electrode
photoconductive
metal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57024579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58142567A (ja
Inventor
Kazumi Komya
Minoru Kanzaki
Mitsuhiko Tashiro
Nobuki Ibaraki
Yoshiko Yoshioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Toshiba Corp
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Nippon Telegraph and Telephone Corp filed Critical Toshiba Corp
Priority to JP57024579A priority Critical patent/JPS58142567A/ja
Publication of JPS58142567A publication Critical patent/JPS58142567A/ja
Publication of JPS6259894B2 publication Critical patent/JPS6259894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/191Photoconductor image sensors

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Facsimile Heads (AREA)
  • Wire Bonding (AREA)
  • Light Receiving Elements (AREA)
JP57024579A 1982-02-19 1982-02-19 画像読取り素子の製造方法 Granted JPS58142567A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57024579A JPS58142567A (ja) 1982-02-19 1982-02-19 画像読取り素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57024579A JPS58142567A (ja) 1982-02-19 1982-02-19 画像読取り素子の製造方法

Publications (2)

Publication Number Publication Date
JPS58142567A JPS58142567A (ja) 1983-08-24
JPS6259894B2 true JPS6259894B2 (enrdf_load_stackoverflow) 1987-12-14

Family

ID=12142070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57024579A Granted JPS58142567A (ja) 1982-02-19 1982-02-19 画像読取り素子の製造方法

Country Status (1)

Country Link
JP (1) JPS58142567A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940567A (ja) * 1982-08-30 1984-03-06 Nippon Telegr & Teleph Corp <Ntt> 光電変換素子
JPH0618260B2 (ja) * 1983-09-16 1994-03-09 セイコーエプソン株式会社 イメージセンサの製造方法

Also Published As

Publication number Publication date
JPS58142567A (ja) 1983-08-24

Similar Documents

Publication Publication Date Title
US4332075A (en) Method of producing thin film transistor array
US4307372A (en) Photosensor
DE69011224T2 (de) Herstellung von elektrischen Messwandlern, speziell von Infrarotdetektorarrays.
EP0345047B1 (en) Thermal imaging device
US4766085A (en) Method of manufacturing contact type one-dimensional image sensor
US4803375A (en) Image sensors and methods of manufacturing same including semiconductor layer over entire substrate surface
JPS6259894B2 (enrdf_load_stackoverflow)
JPS617624A (ja) 密着型イメージセンサ
JPS6367772A (ja) イメ−ジセンサおよびその製造方法
GB2144266A (en) Method of manufacture for ultra-miniature thin-film diodes
JPS6132571A (ja) 光電変換装置
US4701997A (en) Method of making photo-electric converting elements
JP2974151B2 (ja) 密着センサ
JPS58155758A (ja) 光電変換素子およびその製造方法
JPH0476091B2 (enrdf_load_stackoverflow)
JPH0153729B2 (enrdf_load_stackoverflow)
JPH09321328A (ja) 光電変換装置の製造方法
JPS62176159A (ja) イメ−ジセンサの製造方法
JPS6197875A (ja) 半導体装置の製造方法
JPS62119966A (ja) 配線パタ−ンの形成方法
JPS6113663A (ja) イメ−ジセンサの製造方法
JPS61275819A (ja) 二端子素子アクテイブマトリクス液晶表示装置
EP0560531A1 (en) Method for manufacturing a liquid crystal display device
JPS5897860A (ja) 光センサ−
JPH0228975A (ja) イメージセンサの製造方法