JPS6259464B2 - - Google Patents

Info

Publication number
JPS6259464B2
JPS6259464B2 JP52056716A JP5671677A JPS6259464B2 JP S6259464 B2 JPS6259464 B2 JP S6259464B2 JP 52056716 A JP52056716 A JP 52056716A JP 5671677 A JP5671677 A JP 5671677A JP S6259464 B2 JPS6259464 B2 JP S6259464B2
Authority
JP
Japan
Prior art keywords
field effect
pull
well
fet
effect transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52056716A
Other languages
English (en)
Japanese (ja)
Other versions
JPS53141587A (en
Inventor
Mikio Betsusho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP5671677A priority Critical patent/JPS53141587A/ja
Publication of JPS53141587A publication Critical patent/JPS53141587A/ja
Publication of JPS6259464B2 publication Critical patent/JPS6259464B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/858Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP5671677A 1977-05-16 1977-05-16 Complementary field effect semiconductor device Granted JPS53141587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5671677A JPS53141587A (en) 1977-05-16 1977-05-16 Complementary field effect semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5671677A JPS53141587A (en) 1977-05-16 1977-05-16 Complementary field effect semiconductor device

Publications (2)

Publication Number Publication Date
JPS53141587A JPS53141587A (en) 1978-12-09
JPS6259464B2 true JPS6259464B2 (enrdf_load_stackoverflow) 1987-12-11

Family

ID=13035198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5671677A Granted JPS53141587A (en) 1977-05-16 1977-05-16 Complementary field effect semiconductor device

Country Status (1)

Country Link
JP (1) JPS53141587A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS53141587A (en) 1978-12-09

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