JPS6257270B2 - - Google Patents

Info

Publication number
JPS6257270B2
JPS6257270B2 JP57044922A JP4492282A JPS6257270B2 JP S6257270 B2 JPS6257270 B2 JP S6257270B2 JP 57044922 A JP57044922 A JP 57044922A JP 4492282 A JP4492282 A JP 4492282A JP S6257270 B2 JPS6257270 B2 JP S6257270B2
Authority
JP
Japan
Prior art keywords
reaction chamber
substrate
gas
type layer
amorphous silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57044922A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58169980A (ja
Inventor
Shinichiro Ishihara
Takashi Hirao
Koshiro Mori
Motonori Mochizuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57044922A priority Critical patent/JPS58169980A/ja
Priority to US06/476,707 priority patent/US4492605A/en
Publication of JPS58169980A publication Critical patent/JPS58169980A/ja
Publication of JPS6257270B2 publication Critical patent/JPS6257270B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
JP57044922A 1982-03-19 1982-03-19 光起電力素子の製造方法 Granted JPS58169980A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57044922A JPS58169980A (ja) 1982-03-19 1982-03-19 光起電力素子の製造方法
US06/476,707 US4492605A (en) 1982-03-19 1983-03-18 Method of making photovoltaic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57044922A JPS58169980A (ja) 1982-03-19 1982-03-19 光起電力素子の製造方法

Publications (2)

Publication Number Publication Date
JPS58169980A JPS58169980A (ja) 1983-10-06
JPS6257270B2 true JPS6257270B2 (US20100012521A1-20100121-C00001.png) 1987-11-30

Family

ID=12704958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57044922A Granted JPS58169980A (ja) 1982-03-19 1982-03-19 光起電力素子の製造方法

Country Status (2)

Country Link
US (1) US4492605A (US20100012521A1-20100121-C00001.png)
JP (1) JPS58169980A (US20100012521A1-20100121-C00001.png)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110176A (ja) * 1983-11-21 1985-06-15 Agency Of Ind Science & Technol 太陽電池製造装置
US6784033B1 (en) 1984-02-15 2004-08-31 Semiconductor Energy Laboratory Co., Ltd. Method for the manufacture of an insulated gate field effect semiconductor device
US6113701A (en) 1985-02-14 2000-09-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, manufacturing method, and system
DE3685380D1 (de) * 1985-07-29 1992-06-25 Energy Conversion Devices Inc Verfahren und vorrichtung zum kontinuierlichen niederschlagen von elektrischen isolatoren.
US4719123A (en) * 1985-08-05 1988-01-12 Sanyo Electric Co., Ltd. Method for fabricating periodically multilayered film
KR910003169B1 (ko) * 1985-11-12 1991-05-20 가부시끼가이샤 한도다이 에네르기 겐뀨소 반도체 장치 제조 방법 및 장치
US4845043A (en) * 1987-04-23 1989-07-04 Catalano Anthony W Method for fabricating photovoltaic device having improved short wavelength photoresponse
JPH01138765A (ja) * 1987-11-26 1989-05-31 Seiko Epson Corp 光電変換装置の製造方法
JPH01212434A (ja) * 1988-02-19 1989-08-25 Sanyo Electric Co Ltd 成膜方法
JPH02224221A (ja) * 1989-02-27 1990-09-06 Hitachi Ltd 半導体装置製造方法、基板処理装置および半導体装置製造装置
DE4342463C2 (de) * 1993-12-13 1997-03-27 Leybold Ag Verfahren und Vorrichtung zum Beschichten von optischen Linsen mit Schutzschichten und mit optischen Schichten im Vakuum
US6287888B1 (en) 1997-12-26 2001-09-11 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and process for producing photoelectric conversion device
JP4293385B2 (ja) * 1998-01-27 2009-07-08 株式会社半導体エネルギー研究所 光電変換装置の作製方法
US6515785B1 (en) * 1999-04-22 2003-02-04 3M Innovative Properties Company Optical devices using reflecting polarizing materials
US20030044539A1 (en) * 2001-02-06 2003-03-06 Oswald Robert S. Process for producing photovoltaic devices
CN102656707B (zh) * 2009-12-22 2015-04-01 东电电子太阳能股份公司 薄膜硅叠层太阳能电池及其制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4015558A (en) * 1972-12-04 1977-04-05 Optical Coating Laboratory, Inc. Vapor deposition apparatus
JPS55125681A (en) * 1979-03-22 1980-09-27 Sanyo Electric Co Ltd Manufacture of photovoltaic device
JPS56114387A (en) * 1980-02-13 1981-09-08 Sanyo Electric Co Ltd Manufacture of photovoltaic force element
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
US4417092A (en) * 1981-03-16 1983-11-22 Exxon Research And Engineering Co. Sputtered pin amorphous silicon semi-conductor device and method therefor

Also Published As

Publication number Publication date
US4492605A (en) 1985-01-08
JPS58169980A (ja) 1983-10-06

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