JPS6257106B2 - - Google Patents

Info

Publication number
JPS6257106B2
JPS6257106B2 JP55175608A JP17560880A JPS6257106B2 JP S6257106 B2 JPS6257106 B2 JP S6257106B2 JP 55175608 A JP55175608 A JP 55175608A JP 17560880 A JP17560880 A JP 17560880A JP S6257106 B2 JPS6257106 B2 JP S6257106B2
Authority
JP
Japan
Prior art keywords
coating layer
aluminum coating
lead frame
etching
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55175608A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5799763A (en
Inventor
Kenji Konishi
Mamoru Onda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP17560880A priority Critical patent/JPS5799763A/ja
Publication of JPS5799763A publication Critical patent/JPS5799763A/ja
Publication of JPS6257106B2 publication Critical patent/JPS6257106B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4821Flat leads, e.g. lead frames with or without insulating supports
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4821Flat leads, e.g. lead frames with or without insulating supports
    • H01L21/4828Etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lead Frames For Integrated Circuits (AREA)
JP17560880A 1980-12-12 1980-12-12 Manufacture of lead frame for integrated circuit Granted JPS5799763A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17560880A JPS5799763A (en) 1980-12-12 1980-12-12 Manufacture of lead frame for integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17560880A JPS5799763A (en) 1980-12-12 1980-12-12 Manufacture of lead frame for integrated circuit

Publications (2)

Publication Number Publication Date
JPS5799763A JPS5799763A (en) 1982-06-21
JPS6257106B2 true JPS6257106B2 (US07582779-20090901-C00044.png) 1987-11-30

Family

ID=15999063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17560880A Granted JPS5799763A (en) 1980-12-12 1980-12-12 Manufacture of lead frame for integrated circuit

Country Status (1)

Country Link
JP (1) JPS5799763A (US07582779-20090901-C00044.png)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6372889A (ja) * 1986-09-12 1988-04-02 Showa Alum Corp リ−ドフレ−ムの製造方法
JPS63160367A (ja) * 1986-12-24 1988-07-04 Hitachi Ltd 樹脂封止型半導体装置
DE10348715B4 (de) 2003-10-16 2006-05-04 Infineon Technologies Ag Verfahren zum Herstellen eines Flachleiterrahmens mit verbesserter Haftung zwischen diesem und Kunststoff sowie Flachleiterrahmen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4952976A (US07582779-20090901-C00044.png) * 1972-09-22 1974-05-23
JPS553642A (en) * 1978-06-23 1980-01-11 Hitachi Ltd Manufacturing semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4952976A (US07582779-20090901-C00044.png) * 1972-09-22 1974-05-23
JPS553642A (en) * 1978-06-23 1980-01-11 Hitachi Ltd Manufacturing semiconductor device

Also Published As

Publication number Publication date
JPS5799763A (en) 1982-06-21

Similar Documents

Publication Publication Date Title
US7521295B2 (en) Leadframe and method of manufacturing the same
US3042591A (en) Process for forming electrical conductors on insulating bases
JPH10199905A (ja) チップ支持板の粗面化方法
JPS6257106B2 (US07582779-20090901-C00044.png)
JP2000195984A (ja) 半導体装置用キャリア基板及びその製造方法及び半導体装置及びその製造方法
JP4852802B2 (ja) リードフレーム
JP2011181964A (ja) リードフレーム及びその製造方法
JPH0621625A (ja) 印刷配線板及びその製造方法
JPH02106059A (ja) リードフレームの製造方法
JP7404763B2 (ja) リードフレーム、リードフレームの製造方法及び半導体装置の製造方法
JPH022132A (ja) バンプ電極の製造方法
JPS6248386B2 (US07582779-20090901-C00044.png)
JPH04269817A (ja) チップ型固体電解コンデンサの製造方法
JPH02281749A (ja) リードフレームの製造方法
JP2971250B2 (ja) 半導体製品用メッキ装置
JP2925403B2 (ja) 半導体製品用メッキ装置
JPH0987887A (ja) 部分めっき方法
JPH01114046A (ja) 回路基板のAu.Ag−Pdボンデング電極形成法
JPH06310650A (ja) リードフレーム及びその製造方法
JPS61131473A (ja) エツチングによるリ−ドフレ−ムパタ−ンの形成方法
JPS5835957A (ja) 混成集積回路の製造方法
JPH0684979A (ja) 樹脂封止型半導体装置
JPS6192777A (ja) 半田付の前処理方法
JPH0330298B2 (US07582779-20090901-C00044.png)
JP2002344129A (ja) プリント配線板の表面処理方法及びプリント配線板