JPS6253938B2 - - Google Patents

Info

Publication number
JPS6253938B2
JPS6253938B2 JP57223039A JP22303982A JPS6253938B2 JP S6253938 B2 JPS6253938 B2 JP S6253938B2 JP 57223039 A JP57223039 A JP 57223039A JP 22303982 A JP22303982 A JP 22303982A JP S6253938 B2 JPS6253938 B2 JP S6253938B2
Authority
JP
Japan
Prior art keywords
reticle
created
exposure
conductor
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57223039A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59113622A (ja
Inventor
Niwaji Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57223039A priority Critical patent/JPS59113622A/ja
Publication of JPS59113622A publication Critical patent/JPS59113622A/ja
Publication of JPS6253938B2 publication Critical patent/JPS6253938B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57223039A 1982-12-21 1982-12-21 ステツプアンドリピ−ト方式露光方法 Granted JPS59113622A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57223039A JPS59113622A (ja) 1982-12-21 1982-12-21 ステツプアンドリピ−ト方式露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57223039A JPS59113622A (ja) 1982-12-21 1982-12-21 ステツプアンドリピ−ト方式露光方法

Publications (2)

Publication Number Publication Date
JPS59113622A JPS59113622A (ja) 1984-06-30
JPS6253938B2 true JPS6253938B2 (de) 1987-11-12

Family

ID=16791881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57223039A Granted JPS59113622A (ja) 1982-12-21 1982-12-21 ステツプアンドリピ−ト方式露光方法

Country Status (1)

Country Link
JP (1) JPS59113622A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6247129A (ja) * 1985-08-26 1987-02-28 Fujitsu Ltd 半導体装置の製造方法
JPS62147728A (ja) * 1985-12-23 1987-07-01 Fujitsu Ltd 露光方法
JPH03116714A (ja) * 1989-09-28 1991-05-17 Nec Ic Microcomput Syst Ltd 半導体集積回路素子の製造方法

Also Published As

Publication number Publication date
JPS59113622A (ja) 1984-06-30

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