JPS6250975B2 - - Google Patents
Info
- Publication number
- JPS6250975B2 JPS6250975B2 JP3079678A JP3079678A JPS6250975B2 JP S6250975 B2 JPS6250975 B2 JP S6250975B2 JP 3079678 A JP3079678 A JP 3079678A JP 3079678 A JP3079678 A JP 3079678A JP S6250975 B2 JPS6250975 B2 JP S6250975B2
- Authority
- JP
- Japan
- Prior art keywords
- blanking
- information
- electron beam
- register
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 31
- 239000000463 material Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 9
- 238000009826 distribution Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007687 exposure technique Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3079678A JPS54122979A (en) | 1978-03-16 | 1978-03-16 | Electron beam exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3079678A JPS54122979A (en) | 1978-03-16 | 1978-03-16 | Electron beam exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54122979A JPS54122979A (en) | 1979-09-22 |
| JPS6250975B2 true JPS6250975B2 (de) | 1987-10-28 |
Family
ID=12313635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3079678A Granted JPS54122979A (en) | 1978-03-16 | 1978-03-16 | Electron beam exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54122979A (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56165321A (en) * | 1980-05-23 | 1981-12-18 | Fujitsu Ltd | Electron beam projection system |
| JPS57167626A (en) * | 1981-03-31 | 1982-10-15 | Fujitsu Ltd | Electron beam exposure equipment |
| JPS57161900U (de) * | 1981-04-03 | 1982-10-12 | ||
| JPS5825751A (ja) * | 1981-08-10 | 1983-02-16 | Nec Corp | 加入者回線試験器 |
| JPS59229819A (ja) * | 1983-06-13 | 1984-12-24 | Hitachi Ltd | 電子線描画装置 |
| JPS60262420A (ja) * | 1984-06-11 | 1985-12-25 | Nippon Telegr & Teleph Corp <Ntt> | 電子線描画方法及び装置 |
-
1978
- 1978-03-16 JP JP3079678A patent/JPS54122979A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54122979A (en) | 1979-09-22 |
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