JPS62503056A - 高速デイジタル周波数カウンタ− - Google Patents

高速デイジタル周波数カウンタ−

Info

Publication number
JPS62503056A
JPS62503056A JP61503056A JP50305686A JPS62503056A JP S62503056 A JPS62503056 A JP S62503056A JP 61503056 A JP61503056 A JP 61503056A JP 50305686 A JP50305686 A JP 50305686A JP S62503056 A JPS62503056 A JP S62503056A
Authority
JP
Japan
Prior art keywords
print
frequency
rem
htab
vtab
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61503056A
Other languages
English (en)
Japanese (ja)
Inventor
フレイザー　ジエームズ　エス
ガーシア　ジョーキン　ジー
マロニチ　ジョージ　ジー
ストリンス　アーサー
Original Assignee
エムケイ　マニユフアクチユアリング　カンパニ−
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エムケイ　マニユフアクチユアリング　カンパニ− filed Critical エムケイ　マニユフアクチユアリング　カンパニ−
Publication of JPS62503056A publication Critical patent/JPS62503056A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/02—Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Television Signal Processing For Recording (AREA)
  • Chemically Coating (AREA)
  • Feedback Control In General (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
JP61503056A 1985-05-28 1986-05-23 高速デイジタル周波数カウンタ− Pending JPS62503056A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73868685A 1985-05-28 1985-05-28
US738686 1985-05-28

Publications (1)

Publication Number Publication Date
JPS62503056A true JPS62503056A (ja) 1987-12-03

Family

ID=24969061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61503056A Pending JPS62503056A (ja) 1985-05-28 1986-05-23 高速デイジタル周波数カウンタ−

Country Status (6)

Country Link
EP (1) EP0224563A4 (ko)
JP (1) JPS62503056A (ko)
KR (1) KR880700272A (ko)
AU (1) AU5952186A (ko)
ES (1) ES8801866A1 (ko)
WO (1) WO1986007156A1 (ko)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887653A (en) * 1955-04-19 1959-05-19 Bell Telephone Labor Inc Time interval encoder
US3699916A (en) * 1970-08-05 1972-10-24 Gte Automatic Electric Lab Inc An apparatus for monitoring of the deposition of metallic films
US3689747A (en) * 1970-12-09 1972-09-05 Ibm Digital evaporation monitor system
US3670693A (en) * 1971-03-23 1972-06-20 Collins Radio Co Quartz crystal resonator tuning control apparatus
US3864161A (en) * 1973-08-10 1975-02-04 Western Electric Co Method and apparatus for adjusting resonators formed on a piezoelectric wafer
US3936745A (en) * 1974-11-12 1976-02-03 Mdh Industries, Inc. Method of measuring the duration of a discontinuous signal
US4112134A (en) * 1976-03-22 1978-09-05 Transat Corp. Vacuum deposition method for frequency adjustment of piezoelectric resonators
JPS52123670A (en) * 1976-04-09 1977-10-18 Takeda Riken Ind Co Ltd Digital frequency measuring device
JPS5814993B2 (ja) * 1976-12-24 1983-03-23 株式会社東芝 クロノグラフ
CH634424A5 (fr) * 1978-08-18 1983-01-31 Nat Res Dev Procede et appareil de detection et de commande de depot d'une pellicule fine.
US4230991A (en) * 1978-09-11 1980-10-28 Alexandre Paphitis Digital frequency process and method using frequency shifting techniques, especially for low frequency measurements
DE2842450C2 (de) * 1978-09-29 1982-08-19 MITEC Moderne Industrietechnik GmbH, 8012 Ottobrunn Verfahren zur Messung der zeitlichen Abstände von jeweils zwei elektrischen Signalen
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
JPS57144465A (en) * 1981-02-28 1982-09-07 Hitachi Ltd Speed detecting method
DE3336359A1 (de) * 1983-10-06 1985-04-18 Elster AG, Meß- und Regeltechnik, 6700 Ludwigshafen Verfahren zum messen von frequenz oder periodendauer

Also Published As

Publication number Publication date
ES8801866A1 (es) 1988-02-16
EP0224563A1 (en) 1987-06-10
WO1986007156A1 (en) 1986-12-04
ES555416A0 (es) 1988-02-16
AU5952186A (en) 1986-12-24
KR880700272A (ko) 1988-02-22
EP0224563A4 (en) 1990-11-28

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