ES8801866A1 - Procedimiento para medir la frecuencia de una senal desconocida. - Google Patents

Procedimiento para medir la frecuencia de una senal desconocida.

Info

Publication number
ES8801866A1
ES8801866A1 ES555416A ES555416A ES8801866A1 ES 8801866 A1 ES8801866 A1 ES 8801866A1 ES 555416 A ES555416 A ES 555416A ES 555416 A ES555416 A ES 555416A ES 8801866 A1 ES8801866 A1 ES 8801866A1
Authority
ES
Spain
Prior art keywords
high speed
frequency counter
speed digital
digital frequency
unknown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES555416A
Other languages
English (en)
Spanish (es)
Other versions
ES555416A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Emkay Manufacturing Co Inc
Original Assignee
Emkay Manufacturing Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Emkay Manufacturing Co Inc filed Critical Emkay Manufacturing Co Inc
Publication of ES8801866A1 publication Critical patent/ES8801866A1/es
Publication of ES555416A0 publication Critical patent/ES555416A0/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/02—Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Television Signal Processing For Recording (AREA)
  • Chemically Coating (AREA)
  • Feedback Control In General (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
ES555416A 1985-05-28 1986-05-28 Procedimiento para medir la frecuencia de una senal desconocida. Expired ES8801866A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73868685A 1985-05-28 1985-05-28

Publications (2)

Publication Number Publication Date
ES8801866A1 true ES8801866A1 (es) 1988-02-16
ES555416A0 ES555416A0 (es) 1988-02-16

Family

ID=24969061

Family Applications (1)

Application Number Title Priority Date Filing Date
ES555416A Expired ES8801866A1 (es) 1985-05-28 1986-05-28 Procedimiento para medir la frecuencia de una senal desconocida.

Country Status (6)

Country Link
EP (1) EP0224563A4 (ko)
JP (1) JPS62503056A (ko)
KR (1) KR880700272A (ko)
AU (1) AU5952186A (ko)
ES (1) ES8801866A1 (ko)
WO (1) WO1986007156A1 (ko)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887653A (en) * 1955-04-19 1959-05-19 Bell Telephone Labor Inc Time interval encoder
US3699916A (en) * 1970-08-05 1972-10-24 Gte Automatic Electric Lab Inc An apparatus for monitoring of the deposition of metallic films
US3689747A (en) * 1970-12-09 1972-09-05 Ibm Digital evaporation monitor system
US3670693A (en) * 1971-03-23 1972-06-20 Collins Radio Co Quartz crystal resonator tuning control apparatus
US3864161A (en) * 1973-08-10 1975-02-04 Western Electric Co Method and apparatus for adjusting resonators formed on a piezoelectric wafer
US3936745A (en) * 1974-11-12 1976-02-03 Mdh Industries, Inc. Method of measuring the duration of a discontinuous signal
US4112134A (en) * 1976-03-22 1978-09-05 Transat Corp. Vacuum deposition method for frequency adjustment of piezoelectric resonators
JPS52123670A (en) * 1976-04-09 1977-10-18 Takeda Riken Ind Co Ltd Digital frequency measuring device
JPS5814993B2 (ja) * 1976-12-24 1983-03-23 株式会社東芝 クロノグラフ
CH634424A5 (fr) * 1978-08-18 1983-01-31 Nat Res Dev Procede et appareil de detection et de commande de depot d'une pellicule fine.
US4230991A (en) * 1978-09-11 1980-10-28 Alexandre Paphitis Digital frequency process and method using frequency shifting techniques, especially for low frequency measurements
DE2842450C2 (de) * 1978-09-29 1982-08-19 MITEC Moderne Industrietechnik GmbH, 8012 Ottobrunn Verfahren zur Messung der zeitlichen Abstände von jeweils zwei elektrischen Signalen
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
JPS57144465A (en) * 1981-02-28 1982-09-07 Hitachi Ltd Speed detecting method
DE3336359A1 (de) * 1983-10-06 1985-04-18 Elster AG, Meß- und Regeltechnik, 6700 Ludwigshafen Verfahren zum messen von frequenz oder periodendauer

Also Published As

Publication number Publication date
JPS62503056A (ja) 1987-12-03
EP0224563A1 (en) 1987-06-10
WO1986007156A1 (en) 1986-12-04
ES555416A0 (es) 1988-02-16
AU5952186A (en) 1986-12-24
KR880700272A (ko) 1988-02-22
EP0224563A4 (en) 1990-11-28

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