KR880700272A - 고속 디지탈 주파수 카운터 - Google Patents

고속 디지탈 주파수 카운터

Info

Publication number
KR880700272A
KR880700272A KR870700066A KR870700066A KR880700272A KR 880700272 A KR880700272 A KR 880700272A KR 870700066 A KR870700066 A KR 870700066A KR 870700066 A KR870700066 A KR 870700066A KR 880700272 A KR880700272 A KR 880700272A
Authority
KR
South Korea
Prior art keywords
high speed
frequency counter
speed digital
digital frequency
counter
Prior art date
Application number
KR870700066A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR880700272A publication Critical patent/KR880700272A/ko

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/02—Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Television Signal Processing For Recording (AREA)
  • Feedback Control In General (AREA)
  • Chemically Coating (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
KR870700066A 1985-05-28 1987-01-27 고속 디지탈 주파수 카운터 KR880700272A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73868685A 1985-05-28 1985-05-28
PCT/US1986/001098 WO1986007156A1 (en) 1985-05-28 1986-05-23 High speed digital frequency counter

Publications (1)

Publication Number Publication Date
KR880700272A true KR880700272A (ko) 1988-02-22

Family

ID=24969061

Family Applications (1)

Application Number Title Priority Date Filing Date
KR870700066A KR880700272A (ko) 1985-05-28 1987-01-27 고속 디지탈 주파수 카운터

Country Status (6)

Country Link
EP (1) EP0224563A4 (ko)
JP (1) JPS62503056A (ko)
KR (1) KR880700272A (ko)
AU (1) AU5952186A (ko)
ES (1) ES8801866A1 (ko)
WO (1) WO1986007156A1 (ko)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887653A (en) * 1955-04-19 1959-05-19 Bell Telephone Labor Inc Time interval encoder
US3699916A (en) * 1970-08-05 1972-10-24 Gte Automatic Electric Lab Inc An apparatus for monitoring of the deposition of metallic films
US3689747A (en) * 1970-12-09 1972-09-05 Ibm Digital evaporation monitor system
US3670693A (en) * 1971-03-23 1972-06-20 Collins Radio Co Quartz crystal resonator tuning control apparatus
US3864161A (en) * 1973-08-10 1975-02-04 Western Electric Co Method and apparatus for adjusting resonators formed on a piezoelectric wafer
US3936745A (en) * 1974-11-12 1976-02-03 Mdh Industries, Inc. Method of measuring the duration of a discontinuous signal
US4112134A (en) * 1976-03-22 1978-09-05 Transat Corp. Vacuum deposition method for frequency adjustment of piezoelectric resonators
JPS52123670A (en) * 1976-04-09 1977-10-18 Takeda Riken Ind Co Ltd Digital frequency measuring device
JPS5814993B2 (ja) * 1976-12-24 1983-03-23 株式会社東芝 クロノグラフ
JPS55500588A (ko) * 1978-08-18 1980-09-04
US4230991A (en) * 1978-09-11 1980-10-28 Alexandre Paphitis Digital frequency process and method using frequency shifting techniques, especially for low frequency measurements
DE2842450C2 (de) * 1978-09-29 1982-08-19 MITEC Moderne Industrietechnik GmbH, 8012 Ottobrunn Verfahren zur Messung der zeitlichen Abstände von jeweils zwei elektrischen Signalen
US4425871A (en) * 1981-02-09 1984-01-17 Applied Magnetics Corporation Apparatus for sensing deposition of a thin film layer of a material
JPS57144465A (en) * 1981-02-28 1982-09-07 Hitachi Ltd Speed detecting method
DE3336359A1 (de) * 1983-10-06 1985-04-18 Elster AG, Meß- und Regeltechnik, 6700 Ludwigshafen Verfahren zum messen von frequenz oder periodendauer

Also Published As

Publication number Publication date
JPS62503056A (ja) 1987-12-03
AU5952186A (en) 1986-12-24
ES8801866A1 (es) 1988-02-16
ES555416A0 (es) 1988-02-16
EP0224563A1 (en) 1987-06-10
WO1986007156A1 (en) 1986-12-04
EP0224563A4 (en) 1990-11-28

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application