ES8801866A1 - High speed digital frequency counter. - Google Patents
High speed digital frequency counter.Info
- Publication number
- ES8801866A1 ES8801866A1 ES555416A ES555416A ES8801866A1 ES 8801866 A1 ES8801866 A1 ES 8801866A1 ES 555416 A ES555416 A ES 555416A ES 555416 A ES555416 A ES 555416A ES 8801866 A1 ES8801866 A1 ES 8801866A1
- Authority
- ES
- Spain
- Prior art keywords
- high speed
- frequency counter
- speed digital
- digital frequency
- unknown
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
- G01R23/02—Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Abstract
A method and apparatus for computing frequency of an unknown signal using the number of counts of a high and low frequency reference signal which occur between the leading and trailing edges of the pulse of unknown frequency. Method and apparatus is also described utilizing this technique for application in control processes where it is desired to optimize the process by allowing it run at a faster rate and slowing the process as it approaches the desired steady state or other control point in the process.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73868685A | 1985-05-28 | 1985-05-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
ES555416A0 ES555416A0 (en) | 1988-02-16 |
ES8801866A1 true ES8801866A1 (en) | 1988-02-16 |
Family
ID=24969061
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES555416A Expired ES8801866A1 (en) | 1985-05-28 | 1986-05-28 | High speed digital frequency counter. |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0224563A4 (en) |
JP (1) | JPS62503056A (en) |
KR (1) | KR880700272A (en) |
AU (1) | AU5952186A (en) |
ES (1) | ES8801866A1 (en) |
WO (1) | WO1986007156A1 (en) |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2887653A (en) * | 1955-04-19 | 1959-05-19 | Bell Telephone Labor Inc | Time interval encoder |
US3699916A (en) * | 1970-08-05 | 1972-10-24 | Gte Automatic Electric Lab Inc | An apparatus for monitoring of the deposition of metallic films |
US3689747A (en) * | 1970-12-09 | 1972-09-05 | Ibm | Digital evaporation monitor system |
US3670693A (en) * | 1971-03-23 | 1972-06-20 | Collins Radio Co | Quartz crystal resonator tuning control apparatus |
US3864161A (en) * | 1973-08-10 | 1975-02-04 | Western Electric Co | Method and apparatus for adjusting resonators formed on a piezoelectric wafer |
US3936745A (en) * | 1974-11-12 | 1976-02-03 | Mdh Industries, Inc. | Method of measuring the duration of a discontinuous signal |
US4112134A (en) * | 1976-03-22 | 1978-09-05 | Transat Corp. | Vacuum deposition method for frequency adjustment of piezoelectric resonators |
JPS52123670A (en) * | 1976-04-09 | 1977-10-18 | Takeda Riken Ind Co Ltd | Digital frequency measuring device |
JPS5814993B2 (en) * | 1976-12-24 | 1983-03-23 | 株式会社東芝 | Chronograph |
CH634424A5 (en) * | 1978-08-18 | 1983-01-31 | Nat Res Dev | METHOD AND APPARATUS FOR DETECTING AND CONTROLLING THE DEPOSITION OF A FINE FILM. |
US4230991A (en) * | 1978-09-11 | 1980-10-28 | Alexandre Paphitis | Digital frequency process and method using frequency shifting techniques, especially for low frequency measurements |
DE2842450C2 (en) * | 1978-09-29 | 1982-08-19 | MITEC Moderne Industrietechnik GmbH, 8012 Ottobrunn | Method for measuring the time intervals between two electrical signals |
US4425871A (en) * | 1981-02-09 | 1984-01-17 | Applied Magnetics Corporation | Apparatus for sensing deposition of a thin film layer of a material |
JPS57144465A (en) * | 1981-02-28 | 1982-09-07 | Hitachi Ltd | Speed detecting method |
DE3336359A1 (en) * | 1983-10-06 | 1985-04-18 | Elster AG, Meß- und Regeltechnik, 6700 Ludwigshafen | Method for measuring frequency or period |
-
1986
- 1986-05-23 JP JP61503056A patent/JPS62503056A/en active Pending
- 1986-05-23 WO PCT/US1986/001098 patent/WO1986007156A1/en not_active Application Discontinuation
- 1986-05-23 AU AU59521/86A patent/AU5952186A/en not_active Abandoned
- 1986-05-23 EP EP19860903860 patent/EP0224563A4/en not_active Withdrawn
- 1986-05-28 ES ES555416A patent/ES8801866A1/en not_active Expired
-
1987
- 1987-01-27 KR KR870700066A patent/KR880700272A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO1986007156A1 (en) | 1986-12-04 |
EP0224563A4 (en) | 1990-11-28 |
EP0224563A1 (en) | 1987-06-10 |
AU5952186A (en) | 1986-12-24 |
JPS62503056A (en) | 1987-12-03 |
ES555416A0 (en) | 1988-02-16 |
KR880700272A (en) | 1988-02-22 |
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