JPS6250054B2 - - Google Patents
Info
- Publication number
- JPS6250054B2 JPS6250054B2 JP867981A JP867981A JPS6250054B2 JP S6250054 B2 JPS6250054 B2 JP S6250054B2 JP 867981 A JP867981 A JP 867981A JP 867981 A JP867981 A JP 867981A JP S6250054 B2 JPS6250054 B2 JP S6250054B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- drawn
- divide
- vertical
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 14
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP867981A JPS57122526A (en) | 1981-01-23 | 1981-01-23 | Dividing method for drawing figure in electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP867981A JPS57122526A (en) | 1981-01-23 | 1981-01-23 | Dividing method for drawing figure in electron beam exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57122526A JPS57122526A (en) | 1982-07-30 |
JPS6250054B2 true JPS6250054B2 (enrdf_load_stackoverflow) | 1987-10-22 |
Family
ID=11699609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP867981A Granted JPS57122526A (en) | 1981-01-23 | 1981-01-23 | Dividing method for drawing figure in electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57122526A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59229819A (ja) * | 1983-06-13 | 1984-12-24 | Hitachi Ltd | 電子線描画装置 |
JP2680295B2 (ja) * | 1984-03-22 | 1997-11-19 | 株式会社東芝 | 電子ビーム露光装置の描画データ作成方法及びその装置 |
-
1981
- 1981-01-23 JP JP867981A patent/JPS57122526A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57122526A (en) | 1982-07-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR920001801B1 (ko) | 화상확대방법 및 장치 | |
JP2765506B2 (ja) | 論理回路遅延情報保持方式 | |
KR960011567A (ko) | 광근접 효과 보정 시스템 및 그의 방법과 패턴 형성방법 | |
JPH02246687A (ja) | 動きベクトル検出装置 | |
US6373580B1 (en) | Method and apparatus for multi-dimensional interpolation | |
JPH02240779A (ja) | N画素をm画素に変換する装置 | |
JP2017191572A (ja) | 画像処理装置及びその方法、プログラム | |
JPS6250054B2 (enrdf_load_stackoverflow) | ||
US6399954B1 (en) | Charged-particle beam lithography apparatus and system capable of readily detecting abnormality in controlling on-off operation | |
JPH11329957A (ja) | 露光装置用のデ―タ作成方法 | |
KR19980019015A (ko) | 전자빔 노광 보정 방법(Method for compensating electron beam exposure) | |
JPH01288974A (ja) | 画像処理方法 | |
JP2004112281A (ja) | 画像処理装置 | |
JP3330306B2 (ja) | 荷電ビーム描画方法 | |
JPH0371765B2 (enrdf_load_stackoverflow) | ||
JP2691559B2 (ja) | 画素密度変換装置及びその方法 | |
JPS5868928A (ja) | 電子線露光方法 | |
KR0134463B1 (ko) | 개선된 벡터 제한 방법(improved method for limiting vector) | |
JP2838815B2 (ja) | 画像データ処理装置 | |
JPS6390827A (ja) | 荷電粒子線描画方法および装置 | |
JPS6148275A (ja) | 画像信号処理装置 | |
JPS61125125A (ja) | 図形分解装置 | |
JP2691582B2 (ja) | 画素密度変換装置及びその方法 | |
JPWO2004111728A1 (ja) | データ保存方法及びデータ保存装置 | |
JPS6118388B2 (enrdf_load_stackoverflow) |