JPS6249758B2 - - Google Patents

Info

Publication number
JPS6249758B2
JPS6249758B2 JP15571281A JP15571281A JPS6249758B2 JP S6249758 B2 JPS6249758 B2 JP S6249758B2 JP 15571281 A JP15571281 A JP 15571281A JP 15571281 A JP15571281 A JP 15571281A JP S6249758 B2 JPS6249758 B2 JP S6249758B2
Authority
JP
Japan
Prior art keywords
layer
groove
cladding layer
active layer
cladding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15571281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5857771A (ja
Inventor
Shinsuke Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP15571281A priority Critical patent/JPS5857771A/ja
Publication of JPS5857771A publication Critical patent/JPS5857771A/ja
Publication of JPS6249758B2 publication Critical patent/JPS6249758B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223—Buried stripe structure
    • H01S5/2237—Buried stripe structure with a non-planar active layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227—Buried mesa structure ; Striped active layer
    • H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/24—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a grooved structure, e.g. V-grooved, crescent active layer in groove, VSIS laser

Landscapes

  • Semiconductor Lasers (AREA)
JP15571281A 1981-09-30 1981-09-30 半導体レ−ザ Granted JPS5857771A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15571281A JPS5857771A (ja) 1981-09-30 1981-09-30 半導体レ−ザ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15571281A JPS5857771A (ja) 1981-09-30 1981-09-30 半導体レ−ザ

Publications (2)

Publication Number Publication Date
JPS5857771A JPS5857771A (ja) 1983-04-06
JPS6249758B2 true JPS6249758B2 (enrdf_load_stackoverflow) 1987-10-21

Family

ID=15611845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15571281A Granted JPS5857771A (ja) 1981-09-30 1981-09-30 半導体レ−ザ

Country Status (1)

Country Link
JP (1) JPS5857771A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60501634A (ja) * 1983-06-17 1985-09-26 ア−ルシ−エ−　コ−ポレ−ション 平担な活性層を有するレーザ・アレーの製造方法
JP4613304B2 (ja) * 2004-09-07 2011-01-19 独立行政法人産業技術総合研究所 量子ナノ構造半導体レーザ

Also Published As

Publication number Publication date
JPS5857771A (ja) 1983-04-06

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