JPS6241200B2 - - Google Patents
Info
- Publication number
- JPS6241200B2 JPS6241200B2 JP58057925A JP5792583A JPS6241200B2 JP S6241200 B2 JPS6241200 B2 JP S6241200B2 JP 58057925 A JP58057925 A JP 58057925A JP 5792583 A JP5792583 A JP 5792583A JP S6241200 B2 JPS6241200 B2 JP S6241200B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- temperature
- melt
- raw material
- seed crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/28—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5792583A JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
| GB08408563A GB2140704B (en) | 1983-04-04 | 1984-04-03 | Control of crystal pulling |
| US06/596,705 US4586979A (en) | 1983-04-04 | 1984-04-04 | Method for manufacture of III-V group compound semiconductor single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5792583A JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59184795A JPS59184795A (ja) | 1984-10-20 |
| JPS6241200B2 true JPS6241200B2 (enrdf_load_stackoverflow) | 1987-09-01 |
Family
ID=13069577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5792583A Granted JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59184795A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61136989A (ja) * | 1984-12-05 | 1986-06-24 | Toshiba Ceramics Co Ltd | 引上げ法における単結晶育成時の形状制御方法 |
| JP6341291B2 (ja) | 2014-09-29 | 2018-06-13 | 信越半導体株式会社 | 半導体単結晶の再溶融方法 |
| JP6387907B2 (ja) * | 2015-06-18 | 2018-09-12 | 住友金属鉱山株式会社 | 単結晶の製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5144475A (ja) * | 1974-10-14 | 1976-04-16 | Hitachi Ltd | Tanketsushoikuseisochi |
| JPS5641896A (en) * | 1979-09-14 | 1981-04-18 | Toshiba Corp | Manufacture of single crystal |
-
1983
- 1983-04-04 JP JP5792583A patent/JPS59184795A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59184795A (ja) | 1984-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5167651B2 (ja) | 遮熱部材下端面と原料融液面との間の距離の測定方法、及びその距離の制御方法 | |
| US5408952A (en) | Single crystal growth method | |
| US4586979A (en) | Method for manufacture of III-V group compound semiconductor single crystal | |
| US8885915B2 (en) | Method for measuring and controlling distance between lower end surface of heat shielding member and surface of raw material melt and method for manufacturing silicon single crystal | |
| JPH06234592A (ja) | 半導体シリコン単結晶の製造方法 | |
| JPH05339100A (ja) | 化合物半導体単結晶およびその成長方法 | |
| JPH10152389A (ja) | 半導体単結晶の製造装置および製造方法 | |
| KR102241325B1 (ko) | 반도체 단결정 인상장치 및 이것을 이용한 반도체 단결정의 재용융방법 | |
| US8343275B2 (en) | Single crystal growth method and single crystal pulling apparatus for improving yield and productivity of single crystal | |
| JPS6241200B2 (enrdf_load_stackoverflow) | ||
| US8083852B2 (en) | Single crystal growth method and single crystal pulling apparatus | |
| CN109811403A (zh) | 一种拉晶系统和拉晶方法 | |
| US5762704A (en) | Method of fabricating a silicon single-crystal ingot | |
| WO2023051346A1 (zh) | 用于制造氮掺杂的单晶硅的方法 | |
| KR101679071B1 (ko) | 멜트갭 제어 시스템, 이를 포함하는 단결정 성장방법 | |
| KR101266643B1 (ko) | 단결정 성장 온도측정 시스템 및 단결정성장 온도제어방법 | |
| JP5223513B2 (ja) | 単結晶の製造方法 | |
| JPH09118585A (ja) | 単結晶引上装置および単結晶の引上方法 | |
| TWI613334B (zh) | 提高長晶成功率的自動長晶方法 | |
| JPH0952788A (ja) | 単結晶の製造方法及び製造装置 | |
| JPS61261288A (ja) | シリコン単結晶引上装置 | |
| JPH07133187A (ja) | 半導体単結晶の育成方法 | |
| JPH06305877A (ja) | 単結晶成長方法および単結晶成長装置 | |
| JPS6243959B2 (enrdf_load_stackoverflow) | ||
| JPH04325488A (ja) | 液面温度制御方法 |