JPS6241200B2 - - Google Patents
Info
- Publication number
- JPS6241200B2 JPS6241200B2 JP58057925A JP5792583A JPS6241200B2 JP S6241200 B2 JPS6241200 B2 JP S6241200B2 JP 58057925 A JP58057925 A JP 58057925A JP 5792583 A JP5792583 A JP 5792583A JP S6241200 B2 JPS6241200 B2 JP S6241200B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- temperature
- melt
- raw material
- seed crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/28—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5792583A JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
GB08408563A GB2140704B (en) | 1983-04-04 | 1984-04-03 | Control of crystal pulling |
US06/596,705 US4586979A (en) | 1983-04-04 | 1984-04-04 | Method for manufacture of III-V group compound semiconductor single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5792583A JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59184795A JPS59184795A (ja) | 1984-10-20 |
JPS6241200B2 true JPS6241200B2 (enrdf_load_stackoverflow) | 1987-09-01 |
Family
ID=13069577
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5792583A Granted JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59184795A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61136989A (ja) * | 1984-12-05 | 1986-06-24 | Toshiba Ceramics Co Ltd | 引上げ法における単結晶育成時の形状制御方法 |
DE112015003778B4 (de) | 2014-09-29 | 2024-05-23 | Shin-Etsu Handotai Co., Ltd. | Verfahren zum Nachschmelzen des Halbleiter-Einkristalls mit einer Einkristall-Ziehvorrichtung |
JP6387907B2 (ja) * | 2015-06-18 | 2018-09-12 | 住友金属鉱山株式会社 | 単結晶の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5144475A (ja) * | 1974-10-14 | 1976-04-16 | Hitachi Ltd | Tanketsushoikuseisochi |
JPS5641896A (en) * | 1979-09-14 | 1981-04-18 | Toshiba Corp | Manufacture of single crystal |
-
1983
- 1983-04-04 JP JP5792583A patent/JPS59184795A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59184795A (ja) | 1984-10-20 |
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