JPS6240701B2 - - Google Patents
Info
- Publication number
- JPS6240701B2 JPS6240701B2 JP8474383A JP8474383A JPS6240701B2 JP S6240701 B2 JPS6240701 B2 JP S6240701B2 JP 8474383 A JP8474383 A JP 8474383A JP 8474383 A JP8474383 A JP 8474383A JP S6240701 B2 JPS6240701 B2 JP S6240701B2
- Authority
- JP
- Japan
- Prior art keywords
- level
- time
- surface treatment
- end point
- predetermined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 42
- 238000001514 detection method Methods 0.000 claims description 30
- 238000005530 etching Methods 0.000 claims description 25
- 238000004381 surface treatment Methods 0.000 claims description 14
- 238000011161 development Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 15
- 238000012545 processing Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000835 fiber Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58084743A JPS59210442A (ja) | 1983-05-13 | 1983-05-13 | 表面処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58084743A JPS59210442A (ja) | 1983-05-13 | 1983-05-13 | 表面処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59210442A JPS59210442A (ja) | 1984-11-29 |
| JPS6240701B2 true JPS6240701B2 (OSRAM) | 1987-08-29 |
Family
ID=13839167
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58084743A Granted JPS59210442A (ja) | 1983-05-13 | 1983-05-13 | 表面処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59210442A (OSRAM) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0161108U (OSRAM) * | 1987-10-13 | 1989-04-18 | ||
| JPH0240208U (OSRAM) * | 1988-09-12 | 1990-03-19 | ||
| US11925477B2 (en) | 2006-05-03 | 2024-03-12 | Nike, Inc. | Athletic or other performance sensing systems |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6435418A (en) * | 1987-07-30 | 1989-02-06 | Matsushita Electric Industrial Co Ltd | Method for evaluating liquid crystal orientational capacity of oriented film |
-
1983
- 1983-05-13 JP JP58084743A patent/JPS59210442A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0161108U (OSRAM) * | 1987-10-13 | 1989-04-18 | ||
| JPH0240208U (OSRAM) * | 1988-09-12 | 1990-03-19 | ||
| US11925477B2 (en) | 2006-05-03 | 2024-03-12 | Nike, Inc. | Athletic or other performance sensing systems |
| US12263012B2 (en) | 2006-05-03 | 2025-04-01 | Nike, Inc. | Athletic or other performance sensing systems |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59210442A (ja) | 1984-11-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4569717A (en) | Method of surface treatment | |
| EP0345097A3 (en) | Exposure method and apparatus | |
| JPS6240701B2 (OSRAM) | ||
| JP2000124122A5 (OSRAM) | ||
| JPH0142627B2 (OSRAM) | ||
| JPH0142628B2 (OSRAM) | ||
| JPS6240702B2 (OSRAM) | ||
| JPS56146138A (en) | Method and apparatus for exposing photomask | |
| JPH01175741A (ja) | エッチング方法 | |
| DE69921383T2 (de) | Regelung kritischer Abmessungen | |
| JPS6216523A (ja) | レジストパタ−ンの現像方法および現像装置 | |
| JPH0322531A (ja) | 現像方法および現像装置 | |
| KR100529459B1 (ko) | 노광 장비의 렌즈 균일도 측정 장치 | |
| JPS63103951A (ja) | ゴミ検査装置 | |
| JP2731914B2 (ja) | 検査用基板およびその製造方法 | |
| JPH0225851A (ja) | 露光方法 | |
| KR20050099880A (ko) | 반도체 웨이퍼의 센터링 감지 장치 및 이를 이용한 반도체웨이퍼의 센터링 감지 방법 | |
| JPH01251629A (ja) | パーティクルの評価方法 | |
| JPH0525383B2 (OSRAM) | ||
| KR0186077B1 (ko) | 반도체 웨이퍼의 주변노광용 마스크 및 이를 이용한 주변노광방법 | |
| JPS5870530A (ja) | レジストパタ−ン形成方法 | |
| JPH05315213A (ja) | 露光転写によるパターン形成方法 | |
| JPH0563010B2 (OSRAM) | ||
| JPS62216230A (ja) | 投影露光装置に於けるウエハステ−ジ上の異物検出方法 | |
| JPS63318554A (ja) | フォトレジストの現像方法およびその装置 |