JPS6238034B2 - - Google Patents
Info
- Publication number
- JPS6238034B2 JPS6238034B2 JP10250680A JP10250680A JPS6238034B2 JP S6238034 B2 JPS6238034 B2 JP S6238034B2 JP 10250680 A JP10250680 A JP 10250680A JP 10250680 A JP10250680 A JP 10250680A JP S6238034 B2 JPS6238034 B2 JP S6238034B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chemical solution
- porous material
- nozzle
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 29
- 239000000126 substance Substances 0.000 claims description 19
- 239000011148 porous material Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 7
- 238000011282 treatment Methods 0.000 description 6
- 239000007921 spray Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Nozzles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10250680A JPS5727168A (en) | 1980-07-28 | 1980-07-28 | Equipment for wet treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10250680A JPS5727168A (en) | 1980-07-28 | 1980-07-28 | Equipment for wet treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5727168A JPS5727168A (en) | 1982-02-13 |
| JPS6238034B2 true JPS6238034B2 (zh) | 1987-08-15 |
Family
ID=14329278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10250680A Granted JPS5727168A (en) | 1980-07-28 | 1980-07-28 | Equipment for wet treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5727168A (zh) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
| US4838289A (en) * | 1982-08-03 | 1989-06-13 | Texas Instruments Incorporated | Apparatus and method for edge cleaning |
| JPS59112872A (ja) * | 1982-12-16 | 1984-06-29 | Matsushita Electric Ind Co Ltd | 回転塗装装置 |
| JPS59145525A (ja) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | レジスト現像方法 |
| JPS59154361U (ja) * | 1983-04-04 | 1984-10-16 | 三菱レイヨン株式会社 | 塗布装置 |
| JPS61104825A (ja) * | 1984-10-29 | 1986-05-23 | Akira Nakajima | プラスチツク線材の連続一体化装置 |
| JPS63260040A (ja) * | 1987-04-16 | 1988-10-27 | Yamaguchi Nippon Denki Kk | 半導体素子の固着方法 |
| JPH01253235A (ja) * | 1988-03-31 | 1989-10-09 | Sigma Gijutsu Kogyo Kk | 基板処理方法および装置 |
| JP3910151B2 (ja) * | 2003-04-01 | 2007-04-25 | 東京エレクトロン株式会社 | 熱処理方法及び熱処理装置 |
| JP5760439B2 (ja) * | 2010-12-28 | 2015-08-12 | Tdk株式会社 | スラリー供給装置及び塗布装置 |
-
1980
- 1980-07-28 JP JP10250680A patent/JPS5727168A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5727168A (en) | 1982-02-13 |
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