JPS623574B2 - - Google Patents
Info
- Publication number
- JPS623574B2 JPS623574B2 JP3371978A JP3371978A JPS623574B2 JP S623574 B2 JPS623574 B2 JP S623574B2 JP 3371978 A JP3371978 A JP 3371978A JP 3371978 A JP3371978 A JP 3371978A JP S623574 B2 JPS623574 B2 JP S623574B2
- Authority
- JP
- Japan
- Prior art keywords
- wiping tool
- wiping
- cleaning
- semiconductor mask
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 26
- 239000004065 semiconductor Substances 0.000 claims description 23
- 239000007788 liquid Substances 0.000 claims description 14
- 239000007921 spray Substances 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000000428 dust Substances 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3371978A JPS54125980A (en) | 1978-03-23 | 1978-03-23 | Washing device for semiconductor mask cleansing wiper tool |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3371978A JPS54125980A (en) | 1978-03-23 | 1978-03-23 | Washing device for semiconductor mask cleansing wiper tool |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54125980A JPS54125980A (en) | 1979-09-29 |
JPS623574B2 true JPS623574B2 (US20110009641A1-20110113-C00256.png) | 1987-01-26 |
Family
ID=12394201
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3371978A Granted JPS54125980A (en) | 1978-03-23 | 1978-03-23 | Washing device for semiconductor mask cleansing wiper tool |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54125980A (US20110009641A1-20110113-C00256.png) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010253399A (ja) * | 2009-04-27 | 2010-11-11 | Iwatani Internatl Corp | 汚染表面清掃方法 |
CN106179875A (zh) * | 2016-07-29 | 2016-12-07 | 芜湖市振华戎科智能科技有限公司 | 一种加密光盘生产线用滴胶装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5184371U (US20110009641A1-20110113-C00256.png) * | 1974-12-26 | 1976-07-06 |
-
1978
- 1978-03-23 JP JP3371978A patent/JPS54125980A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS54125980A (en) | 1979-09-29 |
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