JPS6234136B2 - - Google Patents

Info

Publication number
JPS6234136B2
JPS6234136B2 JP12690380A JP12690380A JPS6234136B2 JP S6234136 B2 JPS6234136 B2 JP S6234136B2 JP 12690380 A JP12690380 A JP 12690380A JP 12690380 A JP12690380 A JP 12690380A JP S6234136 B2 JPS6234136 B2 JP S6234136B2
Authority
JP
Japan
Prior art keywords
pattern
electron beam
sample point
patterns
determined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12690380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5750433A (en
Inventor
Yasuhide Machida
Noriaki Nakayama
Norishige Hisatsugu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12690380A priority Critical patent/JPS5750433A/ja
Publication of JPS5750433A publication Critical patent/JPS5750433A/ja
Publication of JPS6234136B2 publication Critical patent/JPS6234136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP12690380A 1980-09-12 1980-09-12 Electron beam exposure method Granted JPS5750433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12690380A JPS5750433A (en) 1980-09-12 1980-09-12 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12690380A JPS5750433A (en) 1980-09-12 1980-09-12 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS5750433A JPS5750433A (en) 1982-03-24
JPS6234136B2 true JPS6234136B2 (enrdf_load_stackoverflow) 1987-07-24

Family

ID=14946733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12690380A Granted JPS5750433A (en) 1980-09-12 1980-09-12 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5750433A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536042U (ja) * 1991-10-18 1993-05-18 株式会社小松製作所 燃料噴射装置
JPH0566235U (ja) * 1992-02-13 1993-09-03 株式会社小松製作所 エンジン出力モード切換装置の連結機構

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108378A (ja) * 1982-12-14 1984-06-22 Omron Tateisi Electronics Co 圧電バイモルフの駆動方法
JPS59172233A (ja) * 1983-03-19 1984-09-28 Fujitsu Ltd 電子ビ−ム露光方法
JPH063792B2 (ja) * 1983-06-29 1994-01-12 富士通株式会社 露光パタ−ンデ−タの評価方法
JPS60117622A (ja) * 1983-11-30 1985-06-25 Fujitsu Ltd 露光パタ−ンの検査方法
JPS60117623A (ja) * 1983-11-30 1985-06-25 Fujitsu Ltd 露光パタ−ンの検査方法
JPS60262420A (ja) * 1984-06-11 1985-12-25 Nippon Telegr & Teleph Corp <Ntt> 電子線描画方法及び装置
JPS6221215A (ja) * 1985-07-19 1987-01-29 Fujitsu Ltd 電子ビ−ム露光方法
JPH051091Y2 (enrdf_load_stackoverflow) * 1986-11-25 1993-01-12
JPS64783A (en) * 1987-10-24 1989-01-05 Kogyosha Tsushin Kiki Seisakusho:Kk Piezoelectric actuator
JPH03166713A (ja) * 1989-11-27 1991-07-18 Mitsubishi Electric Corp 電子ビーム露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536042U (ja) * 1991-10-18 1993-05-18 株式会社小松製作所 燃料噴射装置
JPH0566235U (ja) * 1992-02-13 1993-09-03 株式会社小松製作所 エンジン出力モード切換装置の連結機構

Also Published As

Publication number Publication date
JPS5750433A (en) 1982-03-24

Similar Documents

Publication Publication Date Title
US10381194B2 (en) Charged particle beam writing apparatus and charged particle beam writing method
US20090057575A1 (en) Charged particle beam lithography apparatus and charged particle beam lithography method
JPS6234136B2 (enrdf_load_stackoverflow)
US20100237469A1 (en) Photomask, semiconductor device, and charged beam writing apparatus
US11961708B2 (en) Charged particle beam writing apparatus, charged particle beam writing method, and a non-transitory computer-readable storage medium
JPS6112068A (ja) 電子ビームリソグラフ装置における近接効果補正方法
KR20190133110A (ko) 전자 빔 조사 방법, 전자 빔 조사 장치 및 프로그램을 기록한 컴퓨터로 판독 가능한 비일시적인 기록 매체
JP2004140311A (ja) 露光方法および露光装置
WO2001078104A1 (en) Method and apparatus for real-time correction of resist heating in lithography
JPH0336292B2 (enrdf_load_stackoverflow)
JPS58114429A (ja) 電子ビ−ム露光方法
JP2506144B2 (ja) パタ―ンデ―タ補正方法
JPS6250975B2 (enrdf_load_stackoverflow)
JPS6041222A (ja) 電子ビ−ム露光方法
JPS5810824A (ja) 電子ビ−ム露光方法
JPH0336293B2 (enrdf_load_stackoverflow)
JPS6246058B2 (enrdf_load_stackoverflow)
JPS6041223A (ja) 電子ビ−ム露光方法
JPH05217870A (ja) 可変矩形荷電ビーム露光方法及び露光装置
JPS5961133A (ja) 電子ビ−ム露光方法
JPS59119834A (ja) 電子ビ−ム露光方法
JP2597636B2 (ja) パターンデータ補正方法
JPH0837146A (ja) 電子ビーム露光法および電子ビーム露光装置
JPS6041224A (ja) 電子ビ−ム露光方法
JPS59172233A (ja) 電子ビ−ム露光方法