JPS6234135B2 - - Google Patents

Info

Publication number
JPS6234135B2
JPS6234135B2 JP54100874A JP10087479A JPS6234135B2 JP S6234135 B2 JPS6234135 B2 JP S6234135B2 JP 54100874 A JP54100874 A JP 54100874A JP 10087479 A JP10087479 A JP 10087479A JP S6234135 B2 JPS6234135 B2 JP S6234135B2
Authority
JP
Japan
Prior art keywords
electron beam
reference mark
coordinates
mark
coordinate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54100874A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5624933A (en
Inventor
Nobuyuki Yasutake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP10087479A priority Critical patent/JPS5624933A/ja
Publication of JPS5624933A publication Critical patent/JPS5624933A/ja
Publication of JPS6234135B2 publication Critical patent/JPS6234135B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Image Input (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10087479A 1979-08-08 1979-08-08 Method of detecting position of reference mark Granted JPS5624933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10087479A JPS5624933A (en) 1979-08-08 1979-08-08 Method of detecting position of reference mark

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10087479A JPS5624933A (en) 1979-08-08 1979-08-08 Method of detecting position of reference mark

Publications (2)

Publication Number Publication Date
JPS5624933A JPS5624933A (en) 1981-03-10
JPS6234135B2 true JPS6234135B2 (enrdf_load_stackoverflow) 1987-07-24

Family

ID=14285459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10087479A Granted JPS5624933A (en) 1979-08-08 1979-08-08 Method of detecting position of reference mark

Country Status (1)

Country Link
JP (1) JPS5624933A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61165185A (ja) * 1984-12-28 1986-07-25 Fujitsu Ltd 基準点座標自動検出装置
JP2676120B2 (ja) * 1991-06-17 1997-11-12 シャープ株式会社 荷電粒子ビーム分析装置のビーム調整方法
GB2412215B (en) * 2004-03-18 2008-08-13 Hewlett Packard Development Co Position identification pattern

Also Published As

Publication number Publication date
JPS5624933A (en) 1981-03-10

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