JPS6233738B2 - - Google Patents

Info

Publication number
JPS6233738B2
JPS6233738B2 JP19454383A JP19454383A JPS6233738B2 JP S6233738 B2 JPS6233738 B2 JP S6233738B2 JP 19454383 A JP19454383 A JP 19454383A JP 19454383 A JP19454383 A JP 19454383A JP S6233738 B2 JPS6233738 B2 JP S6233738B2
Authority
JP
Japan
Prior art keywords
coating material
semiconductor wafer
film
coating
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19454383A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6085522A (ja
Inventor
Haruhiko Oku
Haruo Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP19454383A priority Critical patent/JPS6085522A/ja
Publication of JPS6085522A publication Critical patent/JPS6085522A/ja
Publication of JPS6233738B2 publication Critical patent/JPS6233738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP19454383A 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置 Granted JPS6085522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19454383A JPS6085522A (ja) 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19454383A JPS6085522A (ja) 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置

Publications (2)

Publication Number Publication Date
JPS6085522A JPS6085522A (ja) 1985-05-15
JPS6233738B2 true JPS6233738B2 (enrdf_load_stackoverflow) 1987-07-22

Family

ID=16326278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19454383A Granted JPS6085522A (ja) 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置

Country Status (1)

Country Link
JP (1) JPS6085522A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235623A (ja) * 1985-08-09 1987-02-16 Fujitsu Ltd 成形レジスト膜とその使用法

Also Published As

Publication number Publication date
JPS6085522A (ja) 1985-05-15

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